A Kinetic Model for the Initial Growth of Diamond Films

QX Liu,JB Wang,GW Yang,JQ You
DOI: https://doi.org/10.1088/1004-423x/7/5/009
1998-01-01
Abstract:Based on a surface reaction mechanism for diamond deposition from the gas phase, a kinetic model is developed to describe diamond nucleation sites and the initial stage of diamond growth in chemical vapor deposition. The time-independent solutions to the rate equations, which describe the steady-state growth of diamond films, is obtained analytically for the case of small ratio of carbon flux to atomic hydrogen flux. The time-dependent solutions obtained by numerical methods for large ratio of carbon to atomic hydrogen flux describe the nucleation and initial gorwth stage of diamond films. This model suggests some general predictions for diamond nucleation and growth and can be used to explain several important experimental phenomena observed by others.
What problem does this paper attempt to address?