Abstract:The micron well-faceted diamond powders have attracted an increasing attention in the polishing filed, owing to improve the surface finish of components using the powders. In the present work, the hot filament chemical vapor deposition (HFCVD) technique is employed for synthesizing such diamond powders. A great many of micron diamonds are grown simultaneously but independently onto a large-area substrate. First, a novel seeding method, spraying the diamond seeds suspension toward the substrate using a spin coater machine, is proposed, with which the seeds with a controlled density are distributed evenly onto the substrate. Also, the method is more suitable for the fabrication of the micron isolated diamonds, compared with other nucleation initiation methods, such as the scratching pre-treatment and electrical biasing on substrates. Afterwards, a systematic investigation is under taken into the effects of deposition parameters on the basic growth characteristics of CVD micron diamonds, and on the inhibition of films growth. Furthermore, the reactive pressure, substrate temperature, carbon concentration, and growth duration are determined to be 4500Pa, 850°C, 1.3–1.4%, 60–90min, respectively. Eventually, under the preferred deposition conditions, approximately 15 million cube-octahedral crystals with the mean size of 2–3μm are deposited simultaneously on the 1000mm2 substrate.

Diamond Seed Size and the Impact on Chemical Vapor Deposition Diamond Thin Film Properties

Size dependent etching of nanodiamond seeds in the early stages of CVD diamond growth

Etching Kinetics of Nanodiamond Seeds in the Early Stages of CVD Diamond Growth

Impact of seed density on continuous ultrathin nanodiamond film formation: an analytical approach

High Resolution Transmission Electron Microscopy Study Of The Initial Growth Of Diamond On Silicon

Enhanced Nucleation and Growth of Diamond Film on Si by CVD Using a Chemical Precursor

The Effect of Deposition Parameters on the Growth Rate of Microcrystalline Diamond Powders Synthesized by HFCVD Method

Low-Temperature Growth Of Ultra-Thin Nano-Crystalline Diamond Films By Hfcvd In A Ch4/H-2 Mixture

Mixed-size diamond seeding for low-thermal-barrier growth of CVD diamond onto GaN and AlN

Electron-Emission-Enhanced Diamond Nucleation on Si by Hot Filament Chemical Vapor Deposition

Chemical Vapor Deposition of <110> Textured Diamond Film through Pre-Seeding by Diamond Nano-Sheets

Characterisation of Microcrystalline Diamonds Deposited by HFCVD

High-quality Diamond Microparticles Containing SiV Centers Grown by Chemical Vapor Deposition with Preselected Seeds

The effect of deposition parameters on the morphology of micron diamond powders synthesized by HFCVD method

Growth of well-adhered and smooth diamond thin films on fused silica substrates

Characteristics of Diamond Crystals Deposited on Quartz Substrates by Chemical Vapor Deposition

Effect of CH4 concentration on the early growth stage of patterned diamond using high seeding density and hot filament chemical vapor deposition

Investigation of Diamond Nucleation under Very Low Pressure in Chemical Vapor Deposition

Unprecedented Differences in the Diamond Nucleation Density Between Carbon- and Silicon-Faces of 4H-Silicon Carbides

Study of diamond film growth mechanism on porous silicon during hot-filament chemical vapor deposition

Study on the Effects of Substrate Grain Size on Diamond Thin Films Deposited on Tungsten Carbide Substrates