HfO 2 -based Junctionless FeFET Array on FDSOI Platform for NAND Memory Application

Yuan Wang,Yang Yang,Pengfei Jiang,Shuxian Lv,Boping Wang,Yuting Chen,Yaxin Ding,Tiancheng Gong,Bing Chen,Ran Cheng,Xiao Yu,Qing Luo
DOI: https://doi.org/10.1109/led.2023.3267787
IF: 4.8157
2023-01-01
IEEE Electron Device Letters
Abstract:In this letter, HfO2-based junctionless ferroelectric-gate field effect transistors (FeFETs) and the FeFET NAND memory arrays are proposed and experimentally demonstrated, on FDSOI. High performance including ultra-low leakage( $sim $ pA) and ultra-high $ ext{I}_{ ext {PGM}}/ ext{I}_{ ext {ERS}}$ ratios ( $10^{{5}}{)}$ can be achieved. Furthermore, the memory functions of the NAND arrays are experimentally demonstrated. FDSOI-based NAND FeFETs will be promising for the next-generation high density, low power memory and edge computing.
engineering, electrical & electronic
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