High quality a-InGaZnO and a-ZrAlO deposited at 375 °C by spray pyrolysis for low voltage operation TFTs

Arqum Ali,Md Mobaidul Islam,Mohammad Masum Billah,Samiran Roy,Byeonggwan Kim,Md. Hasnat Rabbi,Jin Jang
DOI: https://doi.org/10.1016/j.matlet.2024.136600
IF: 3
2024-05-09
Materials Letters
Abstract:We report the high-performance, bottom-gate a-InGaZnO (IGZO) TFT with high-k ZrAlO (ZAO) gate insulator by spray pyrolysis (SP). The a-IGZO/ZAO TFT exhibits the average saturation mobility of 23.12 cm 2 V −1 s −1 , subthreshold swing of 121 mV dec -1 , I ON/OFF ratio of ∼10 8 with no hysteresis and low off-state current of ∼10 -19 A μm −1 . In addition, the TFT exhibits good interface quality with less trap density (∼9x10 10 cm −2 ) and conduction band tail state (∼4.3x10 18 cm −3 ) extracted from TCAD fitting. The high-performance is attributed to the formation of uniform and dense a-IGZO and ZAO thin films with low defect density. Therefore, the SP a-IGZO/ZAO TFTs have great potential to be employed in low-cost, low driving voltage TFTs for display application.
materials science, multidisciplinary,physics, applied
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