Growth of Polycrystalline n- CrSe2 Nanosheets Onto p –Si Substrates and their Applications as Rectifiers and Gigahertz Band Filters

Sabah. E. Algarni,A. F. Qasrawi,Najla. M. Khusayfan
DOI: https://doi.org/10.1007/s12633-023-02842-4
IF: 3.4
2024-01-10
Silicon
Abstract:In the current study polycrystalline nanosheets of CrSe 2 of thicknesses of 100 nm are deposited onto type silicon substrate by a vacuum evaporation technique under a vacuum pressure of 10 –5  mbar. Experimental and theoretical structural investigations have shown the preferred growth of trigonal CrSe 2 . The unit cell parameters being a = b = 3.520 Å,c = 5.889 Å and fits well with the standards of trigonal CrSe 2 structure. Nanosheets of chromium selenide displayed low defect density of the order of 10 10 lines/cm 2 along the and axes. Surface morphology studies have shown that CrSe 2 nanosheets is composed of spherical grains of average sizes of 200 nm. Optically the interfacing of the n– type CrSe 2 nanosheets with type Si results in formation of a conduction and valence band offsets of 0.95 eV and 0.47 eV, respectively. These band offsets were found sufficient to allow running the Si/CrSe 2 interfaces as junction devices. The devices displayed a biasing dependent rectification ratios (asymmetry). The ratios which reached value of 70 can be varied with the applied voltage. Deep analyses of the current transport mechanism of these rectifiers have shown the domination by thermionic and tunneling mechanisms under forward and reverse biasing conditions, respectively. Moreover the pn junction device showed features of band filters with cutoff frequency values suiting gigahertz technology making the device attractive for multifunction operations.
materials science, multidisciplinary,chemistry, physical
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