A Universal Growth Method for High Quality Phase-Engineered Germanium Chalcogenide Nanosheets

Junyu Qu,Chenxi Liu,Muhammad Zubair,Zhouxiaosong Zeng,Bo Liu,Ziyu Luo,Shula Chen,Anlian Pan,xin Yang,xiao yi,ying Chen
DOI: https://doi.org/10.1039/d2nr05657g
IF: 6.7
2023-01-22
Nanoscale
Abstract:Low-dimensional group IV-VI metal chalcogenide-based semiconductors hold great promises for opto-electronic device applications owing to their diverses crystalline phases and intriguing properties related to thermoelectric and ferroelectric effects. Here, we demonstrate a universal chemical vapor deposition (CVD) growth method to synthesize stable germanium chalcogenides-based (GeS, GeS2, GeSe, GeSe2) nanosheets which increase the library of the p-type semiconductor. The phase transition between different crystalline polytypes can be deternimistically controlled by hydrogen concentration in the reaction chamber. Structural characterization and synthesis experiments indentify the behavior which the higher hydrogen concentration promote the transiton from Germanium dichalcogenides to Germanium monochalcogenides. The angle-polarized and temperature-dependent Raman spectra demonstrate the strong interlayer coupling and lattice orientation. Based on the optimized growth scheme and systematic comparison of electrical properties, GeSe nanosheet photodetectors were demonstrated, which exhibit superior device performance on SiO2/Si and HfO2/Si substrate with a high photoresponsivity up to 104 A/W, fast response time less than 15 ms and high mobility of 3.2 cm2V-1s-1 which is comparable with the mechanical exfoliated crystals. Our results manifest hydrogen-mediated deposition strategy as a facile control knob to engineer crystalline phases of germanium chalcogenides for high performance optoelectronic devices.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
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