Abstract:In this study, to explore the impact of nitrogen on chemical composition, morphology, microstructure, as well as intrinsic stress of titanium films, nitrogen-doped titanium thin films prepared by direct current reactive magnetron sputtering, with different ratio of nitrogen doping into the Argon gas, have been characterized. After the check of grazing incidence X-ray reflectometry (GIXR), thickness of all samples were ensured to be approximately 40 nm. Using the X-ray photoelectron spectroscopy (XPS) combined with X-ray diffraction (XRD), nitrogen atoms were found to transform Ti crystals from the hexagonal close-packed (hcp) <math>α</math>-Ti phase with Ti(100) and Ti(002) orientation to the face-centered cubic(fcc) <math>δ</math>-TiN phase with TiN(111) and TiN(200) orientations, accompanied by the formation of <math>TiO2</math> and TiON. XRD diffraction patterns further revealed the expansion of the TiN lattice and the intensity transform of TiN(111) and TiN(200). Atomic force microscopy (AFM) results indicated that the surface roughness declined continuously. A compressive stress was found to increase gradually with increasing nitrogen content. Variations in stress are caused by the expansion of the crystal lattice. It is obvious that the incorporation of nitrogen into titanium films can effectively reduce the roughness, but it will result in an increase in the compressive stress. Therefore, an appropriate nitrogen partial pressure should be chosen to control the intrinsic stress while reducing the roughness effectively.

Effect of nitrogen concentration to the structural, chemical and electrical properties of tantalum zirconium nitride films

Influence of nitrogen concentration on electrical, mechanical, and structural properties of tantalum nitride thin films prepared via DC magnetron sputtering

Effects of nitrogen composition on the resistivity of reactively sputtered TaN thin films

Effects of Tantalum Concentration on the Microstructures and Mechanical Properties of Tungsten-Tantalum Alloys

Structure, Composition and Mechanical Properties of Reactively Sputtered (tivcrtaw)nx High-Entropy Films

Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering

Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

Microstructure and Thermal Diffusivity Investigations of RF-Sputtered Tantalum Nitride Films

Effect of gas Pressure on the Mechanical Properties of Sputtered TaN Films

Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)NX Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity

Effects of Nitrogen Flow Ratio on the Structure and Properties of Reactively Sputtered (almonbsitativzr)n(x) Coatings

Effects of nitrogen content on structure and mechanical properties of multi-element (AlCrNbSiTiV)N coating

Structural Correlation In Tantalum Nitride Formation By Direct Nitrogen Implantation

Evolution of chemical, structural, and mechanical properties of titanium nitride thin films deposited under different nitrogen partial pressure

Microstructure, mechanical properties and tribological behavior of (TiZrHfNbTa)N x high entropy films deposited by magnetron sputtering

Effects of nitrogen content on microstructures and mechanical properties of (AlCrTiZrHf)N high-entropy alloy nitride films

Characteristics of Tantalum Oxynitride Films Prepared by Rf Magnetron Sputtering

Stoichiometry Effects on the Chemical Ordering and Superconducting Properties in TiZrTaNbNx Refractory High Entropy Nitrides

Synthesis of Medium Entropy Coatings and Study of the Influence of Bias Voltage and Nitrogen Flow on Their Microstructural and Tribological Properties

Effects of Nitrogen Content on the Structure and Mechanical Properties of (Al0.5CrFeNiTi0.25)Nx High-Entropy Films by Reactive Sputtering

Effect of NbN and ZrN Films Formed by Magnetron Sputtering on Ti and Porcelain Bonding