Abstract:In this work, thin films of TaN were synthesized on 304 steel substrates using the reactive DC sputtering technique from a tantalum target in a nitrogen/argon atmosphere. All synthesis parameters such as gas ratio, pressure, gas flow, and substrate distance, among others, were fixed except the applied power of the source for different deposited coatings. The effect of the target power on the formation of the resulting phases and the microstructural and morphological characteristics was studied using XRD and AFM techniques, respectively, in order to understand the growth mechanisms. Phase, line profile, texture, and residual stress analysis were carried out from the X-ray diffraction patterns obtained. Atomic force microscopy analysis allowed us to obtain values for surface grain size and roughness which were related to growth mechanisms in accordance with XRD results. Results obtained showed a strong correlation between the growth energy with the crystallinity of the samples and the formation of the possible phases since the increase in the growth power caused the samples to evolve from an amorphous structure to a cubic monocrystalline structure. For all produced samples, the δ-TaN phase was observed despite the low N2 content used in the process (since for low N2 content it was expected to be possible to obtain films with α-Ta or hexagonal ε-TaN crystalline structure). In order to determine the corrosion resistance of the coatings, electrochemical impedance spectroscopy and polarization resistance were employed in the Tafel region. The results obtained through this evaluation showed a direct relationship between the power used and the improvement of the properties against corrosion for specific grain size values.

Influence of nitrogen concentration on electrical, mechanical, and structural properties of tantalum nitride thin films prepared via DC magnetron sputtering

Effects of nitrogen composition on the resistivity of reactively sputtered TaN thin films

Effect of nitrogen concentration to the structural, chemical and electrical properties of tantalum zirconium nitride films

Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering

Effect of Nitrogen Content on the Mechanical and Biological Properties of Tantalum Nitride Coatings

Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

Effects of Nitrogen Content on Microstructures and Mechanical Behavior of (titacrmonb)nx Films

Effect of Nitrogen Flow Ratio on Degradation Behaviors and Failure of Magnetron Sputter Deposited Tantalum Nitride

Tantalum Nitride Thin Film with a Nearly Zero Temperature Coefficient of Resistance Synthesized by Magnetron Co-Sputtering

Influences of nitrogen partial flux on the micro-structures and properties of TaN thin films

Microstructure and Thermal Diffusivity Investigations of RF-Sputtered Tantalum Nitride Films

COMPOSITION CONTROL AND ITS ELECTRICAL PROPERTIES OF TaNx THIN FILMS

Growth Mechanisms of TaN Thin Films Produced by DC Magnetron Sputtering on 304 Steel Substrates and Their Influence on the Corrosion Resistance

Effect of gas Pressure on the Mechanical Properties of Sputtered TaN Films

Evolution of chemical, structural, and mechanical properties of titanium nitride thin films deposited under different nitrogen partial pressure

Structure, Composition and Mechanical Properties of Reactively Sputtered (tivcrtaw)nx High-Entropy Films

Biomedical Properties of Tantalum Nitride Films Synthesized by Reactive Magnetron Sputtering

Microstructural and Electrical Resistivity of TiN Electrode Films Prepared by Direct Current (DC) Reactive Magnetron Sputtering

Influences of Annealing Treatment on the Microstructure and Electric Properties of TaN Thin Films

Tribological Properties of Ta‐C‐N and Ta‐N Thin Films

Study of optical and electrical properties of TiN thin films prepared by cathodic ion sputtering