A Direct Method to Extract Transient Sub-Gap Density of State (DOS) Based on Dual Gate Pulse Spectroscopy
Mingzhi Dai,Karim Khan,Shengnan Zhang,Kemin Jiang,Xingye Zhang,Weiliang Wang,Lingyan Liang,Hongtao Cao,Pengjun Wang,Peng Wang,Lijing Miao,Haiming Qin,Jun Jiang,Lixin Xue,Junhao Chu
DOI: https://doi.org/10.1038/srep24096
IF: 4.6
2016-01-01
Scientific Reports
Abstract:Sub-gap density of states (DOS) is a key parameter to impact the electrical characteristics of semiconductor materials-based transistors in integrated circuits. Previously, spectroscopy methodologies for DOS extractions include the static methods, temperature dependent spectroscopy and photonic spectroscopy. However, they might involve lots of assumptions, calculations, temperature or optical impacts into the intrinsic distribution of DOS along the bandgap of the materials. A direct and simpler method is developed to extract the DOS distribution from amorphous oxide-based thin-film transistors (TFTs) based on Dual gate pulse spectroscopy (GPS), introducing less extrinsic factors such as temperature and laborious numerical mathematical analysis than conventional methods. From this direct measurement, the sub-gap DOS distribution shows a peak value on the band-gap edge and in the order of 10 17 –10 21 /(cm 3 ·eV), which is consistent with the previous results. The results could be described with the model involving both Gaussian and exponential components. This tool is useful as a diagnostics for the electrical properties of oxide materials and this study will benefit their modeling and improvement of the electrical properties and thus broaden their applications.