Abstract:Undoped and nitrogen (N)_doped Cu2O/CuO thin films were deposited via reactive DC magnetron sputtering. The deposition was carried out by sputtering the Cu targets under various Ar/N2/O2 gas flow ratios. The structural, optical, wettability, and photocatalytic performance of the deposited films were investigated. A simple cubic Cu2O crystallographic phase is observed for the undoped film, whereas mixed cubic Cu2O and monoclinic CuO phases (Cu2O/CuO) are observed for the N_doped films. EDAX revealed that as the N2 flow rate increased the amount of nitrogen incorporated into the film increased. The transmittance and reflectance are affected by the incorporation of nitrogen into the films. The transmittance values decreased with increasing N2 flow rate, whereas the reflectance values increased. Both the refractive index and extinction coefficient almost increased with increasing N2 flow rate. A noticeable optical band gap narrowing from 2.55 eV to 2.39 eV was detected upon increasing the N2 flow from 0.0 to 190 sccm. The photoluminescence spectrum of the undoped sample contains five distinct bands at 518, 612, 654, 714 and 825 nm. These five maxima are attributed to the radiative decay of bound and free excitons, and oxygen vacancies (VO) After nitrogen incorporation, the photoluminescence intensity decreases and then increases again with increasing N2 flow rate. A reduction in the water contact angle was observed with increasing N2 flow rate. Upon Vis-light illumination, the N_doped Cu2O/CuO films reached superhydrophilicity faster than the undoped film did. The photocatalytic performance of the deposited Cu2O/CuO films was strongly enhanced with a small amount of N doping. The deposited films are promising for self-cleaning and photocatalytic degradation of organic wastes.

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