Pulse force nanolithography on hard surfaces using atomic force microscopy with a sharp single-crystal diamond tip

Alexei Temiryazev

DOI: https://doi.org/10.48550/arXiv.1312.0796

2013-12-03

Abstract:AFM-based technique of nanolithography is proposed. The method enables rapid point by point indentation with a sharp tip. When used in tandem with single-crystal diamond tips, this technique allows the creation of high aspect ratio grooves in hard materials, such as silicon or metals. Examples of fabricated groove arrays on Si surface with 30-100 nm pitches and 5-32 nm depths are presented. Cutting of a 63nm thick metal magnetic film demonstrated. The resulting structure is studied by use of magnetic force microscopy.

Mesoscale and Nanoscale Physics

What problem does this paper attempt to address?

The problem that this paper attempts to solve is how to achieve high - aspect - ratio (high - depth - to - width - ratio) nano - etching on hard surfaces (such as silicon or metal). Traditional mechanical etching methods are difficult to obtain the ideal depth - to - width ratio on hard materials, usually only reaching 0.1 to 0.3. To overcome this limitation, the author proposes a pulse - force nanolithography (PFNL) technology based on atomic force microscopy (AFM), using a single - crystal diamond tip for fast point - to - point indentation operations.

### Main problems and solutions

1. **Limitations of traditional methods**:
- For hard materials (such as silicon, metal), although the traditional scratching method is commonly used, the depth of the grooves it generates is much smaller than the width, resulting in a low aspect ratio.
- Using probes with a large radius of curvature (such as diamond pyramid tips on stainless - steel cantilevers), although a large normal force can be applied, it is difficult to achieve high - resolution and high - aspect - ratio etching on hard materials.

2. **Proposed solutions**:
- **Using single - crystal diamond tips**: Such tips have an extremely high aspect ratio and a small radius of curvature (< 10 - 15 nm), can provide excellent AFM imaging quality, and can achieve finer etching on hard materials.
- **Pulse - force nanolithography (PFNL)**: By applying a short - pulse force (with a duration of about 1 millisecond), the tip is quickly pressed into the surface at each point and then moved to the next point. This method avoids the risk of damaging the tip when moving on hard materials and at the same time increases the etching speed.

### Experimental results

- **Preparation of line arrays on the silicon surface**: Through the PFNL technology, groove arrays with a spacing of 30 - 100 nm and a depth of 5 - 32 nm were successfully prepared on the silicon surface, achieving a relatively high aspect ratio (up to 2.3 at most).
- **Cutting of magnetic metal films**: Using the PFNL technology, a 63 - nm - thick CoCr magnetic metal film was cut, and the formed groove had a depth of about 72 nm and a width of about 40 nm. The structure after cutting was further studied by magnetic force microscopy (MFM) and electrostatic force microscopy (EFM), verifying the effectiveness of the cutting and the electrical insulation.

### Conclusion

By using single - crystal diamond tips and PFNL technology, high - resolution and high - aspect - ratio nano - etching can be achieved on hard materials, demonstrating the potential of this technology in manufacturing complex nanostructures.