Abstract:Timely repair of fused silica damage ensures the stable operation of high-power laser systems. In the traditional repair process, the material nearby the damaged area is gradually ablated with CO2 or femtosecond laser. Subsequently, homogenization and residual stress removal are required because of the microcracks and thermal accumulation generated with the ablation. As a result, the repair efficiency is greatly restricted. In this paper, a new method using in-volume, selective femtosecond laser-induced etching to repair the damage of fused silica is proposed. The region irradiated by femtosecond laser becomes more susceptible to the etching solution due to its constitutive characteristics having undergone chemical restructuring. In this way, material nearby the damaged area transparent to the laser radiation is modified locally inside the volume. A femtosecond laser is used to scan the damaged area with a 3D hollow trajectory. The applicable modification of fused silica occurs when the single pulse energy is approximately 2 μJ to 5 μJ, the repetition frequency is approximately 200 kHz to 500 kHz, and the scanning speed is approximately 10 mm/s. Then, the etching solution reacts quickly along the 3D profile of the modified path, and the damaged area is removed as a whole piece. This method can greatly reduce the workload of repair, and the etching process of fused silica is carried out synchronously. So, the etching efficiency is not affected by the number of damage points. In addition, the weak reaction between the etching solution and the substrate could homogenize the interface. It provides an efficient way to repair the surface damage of fused silica.

Preparation of convex edges in fused silica by single pass perforation with a 2D Airy–Gaussian beam

Shaping convex edges in borosilicate glass by single pass perforation with an Airy beam

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Fabrication of high-aspect-ratio fused silica microstructures with large depths using Bessel-beam femtosecond laser-assisted etching

Thick Glass High-Quality Cutting by Ultrafast Laser Bessel Beam Perforation-Assisted Separation

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Study on 532nm and CO2 laser processing of fused silica glass

Morphological Investigation at the Front and Rear Surfaces of Fused Silica Processed with Femtosecond Laser Pulses in Air.

Femtosecond laser modification combined with chemical etching to achieve high-quality cutting of millimeter-thick fused silica

Formation Mechanism of a Smooth, Defect-Free Surface of Fused Silica Optics Using Rapid CO2 Laser Polishing

Convex Silica Microlens Arrays Via Femtosecond Laser Writing.

Investigation on Hybrid Laser Ablation and Its Application in Fused Silica Damage Mitigation.

Research on Laser-Assisted Micro-Milling of Fused Silica

Dual-control of incubation effect for efficiently fabricating surface structures in fused silica

Rapid CO2 Laser Processing Technique for Fabrication of Micro-Optics and Micro-Structures on Fused Silica Materials

Experimental study on direct fabrication of micro channel on fused silica by picosecond laser

Morphology evolution mechanisms and localized structural modification of repaired sites on fused silica optics processed by CO2 laser rapid ablation mitigation

Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

Micro Milling of Fused Silica Using Picosecond Laser Shaped Single Crystal Diamond Tools

New Progress of CO2 Laser Processing Techniquesfor Fused Silica Optics