High-Performance WSe 2 Top-Gate Devices with Strong Spacer Doping

Po-Hsun Ho,Yu-Ying Yang,Sui-An Chou,Ren-Hao Cheng,Po-Heng Pao,Chao-Ching Cheng,Iuliana Radu,Chao-Hsin Chien
DOI: https://doi.org/10.1021/acs.nanolett.3c02757
IF: 10.8
2023-11-01
Nano Letters
Abstract:Because of the lack of contact and spacer doping techniques for two-dimensional (2D) transistors, most high-performance 2D devices have been produced with nontypical structures that contain electrical gating in the contact regions. In the present study, we used chloroauric acid (HAuCl(4)) as a strong p-dopant for WSe(2) monolayers used in transistors. The HAuCl(4)-doped devices exhibited a record-low contact resistance of 0.7 kΩ·μm under a doping concentration of 1.76 × 10^(13) cm^(-2). In...
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
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