Influence of Dopant Uniformity on Electron Transport in Cu x Bi 2 Se 3 Films

Dan Han,Zhenhua Wang,Xuan P. A. Gao,Zhidong Zhang
DOI: https://doi.org/10.1021/acs.cgd.0c01418
2020-12-22
Abstract:The contribution of topological insulator surface states to their transport properties can be tuned by doping, but the uniformity effect of the dopants has been ignored in previous studies. In this work, we studied the influence of the degree of uniformity on high-quality Cu<sub><b>x</b></sub>Bi<sub>2</sub>Se<sub>3</sub> films prepared by pulsed laser deposition with a designed sequential deposition process of Bi<sub>2</sub>Se<sub>3</sub> and Cu. It was found that with a greater uniformity of the Cu dopants a two-dimensional electron–electron interaction (2D EEI) effect becomes more evident below ∼25 K in the presence of weak disorder and a weak antilocalization (WAL) effect near zero magnetic field becomes more pronounced at low temperature. Furthermore, the topological surface state conduction of the Cu<sub><i>x</i></sub>Bi<sub>2</sub>Se<sub>3</sub> films was verified by the Hikami–Larkin–Nagaoka (HLN) model analysis of the WAL effect. This research may open up new aspects for the further study of the transport properties of disordered topological insulators.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acs.cgd.0c01418?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acs.cgd.0c01418</a>.Detailed XRD results for the thinner Cu<sub><i>x</i></sub>Bi<sub>2</sub>Se<sub>3</sub> films #S1 and #S2 with 30 s of total Bi<sub>2</sub>Se<sub>3</sub> deposition time (<i>x</i> = 0, 0.3 ± 0.05) and an analysis of the transport properties of the thinner Cu<sub><i>x</i></sub>Bi<sub>2</sub>Se<sub>3</sub> films #S1 and #S2 (<a class="ext-link" href="/doi/suppl/10.1021/acs.cgd.0c01418/suppl_file/cg0c01418_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.
chemistry, multidisciplinary,materials science,crystallography
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