Broad beam ion implantation machine uniformity regulating device

张进学

2014-09-17

Abstract:The invention discloses a broad beam ion implantation machine uniformity regulating device and aims to solve the problem that the broadband beam uniformity is difficult to control. The regulating device comprises an analyzing diaphragm, a broad parallel lens, a multi-pole regulating mechanism and a vertical scanning substrate. The broad parallel lens is arranged at the outlet of broadband ion flows of the analyzing diaphragm, and the broadband ion flows enter the broad parallel lens at the certain flare angle; the outlet of the broad parallel lens is provided with the multi-pole regulating mechanism regulating the beam flow deflection angle, so that beam flow horizontal density distribution is changed when the ion beams arrive in the vertical scanning substrate, and the uniformity of the horizontal beam flow distribution of ion beams is adjusted; the vertical scanning substrate is arranged at the outlet of the multi-pole regulating mechanism to scan the ion flows vertically and uniformly, and the vertical uniformity of the ion flows is guaranteed. The device is simple to control, has fine adjusting effect and is capable of meeting the beam uniformity adjustment of a broadband ion implantation machine.

Engineering,Physics,Materials Science