Influence of high-voltage source stability on submicron beam diameter in focused ion beam optical system

Guifang Dong,Jianru Wang,Genyu Ying,Keqian Zhang
1998-01-01
Abstract:A two-lens focused ion beam system for sub-micro-fabrication was introduced. By theoretical calculation and computer simulation, the fluctuations of ion beam diameter caused by ion source voltage, extractor voltage and focusing voltage were analyzed from aberration and mis-focusing aspects. The fluctuation coefficient should be less than 10-5 when the ion beam diameter is smaller than 0.2 μm. The method for making the high-voltage source with high stability was described.
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