Research of Voltage's Stability in 0.2μm Focused Ion Beam System

DONG Guifang,ZHANG Keqian,WANG Jianru,YING Genyu
DOI: https://doi.org/10.3321/j.issn:1000-0054.1999.05.019
1999-01-01
Abstract:In order to produce an ion beam diameter smaller than 0.2μm in our two lens FIB system and to perform microfabrication stably, we analyzed the factors which influence the size and stability of ion beam. More particularly, from aspects of aberration, misfocussing and drifting, with theory calculation and computer simulation, we researched the fluctuations of ion beam diameter caused by high voltage powers including ion energy voltage, extractor voltage and focusing voltage, which control the optical column characteristics, and low voltage powers including alignment voltage, astigmator voltage and deflector voltage. The results indicate that when the beam diameter is smaller than 0.2μm, the fluctuation coefficient of the high voltages is 1×10 -4 ~1×10 -5 and that of the low voltages is 6×10 -4 ~1×10 -4 .
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