Focused-ion-beam stress introducing technology for micro/nano-fabrications

Yifei MAO,Wengang WU,Jun XU
DOI: https://doi.org/10.3969/j.issn.1000-6281.2016.04.015
2016-01-01
Abstract:Focused ion beam ( FIB) technology is often applied in the fields of ultra?fine fabrication and TEM sample?preparation, because of its advantages of ultra?fine etching, pointing process and real?time imaging. The fundamental methods include three aspects:etching, deposition and imaging. Here two novel fabrication methods based on FIB are presented, which are called FIB stress introduced deformation ( FIB?SID) and FIB material redistribution induced deformation ( FIB?MRD) . FIB?SID can precisely control the bending of structures by adjusting the relationship between ion implantation and sputtering during FIB scanning, and FIB?MRD will help build nano?structures utilizing Rayleigh instability during the interaction between ions and the target. By these methods, three dimensional micro/nano?helices, suspended and smooth ultra?thin nanowires as well as large scale nanopore arrays will be produced, which will have great potential in the fields such as micro?fluidic systems, Terahertz communication systems and optical antennas and so on.
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