Reflective X-ray masks for X-ray lithography

Vitaliy S. Chumak,Sergey Peredkov,Alexander Yu. Devizenko,Igor A. Kopylets,Yuriy P. Pershyn
DOI: https://doi.org/10.1088/1361-6439/ad2f48
2024-03-04
Journal of Micromechanics and Microengineering
Abstract:Application of X-ray multilayers as reflective X-ray masks (RXMs) for X-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect X-rays. The use of grazing geometry allows a pattern design on the mask to be compressed in one direction. Application examples are given for the masks (WC/Si multilayers) with two types of a radiation source: an X-ray tube (λ=0.154 nm) and a synchrotron (λ~0.35 nm). The compression of the mask segments by 14-30 times with the imprint size in the resist plane 3.5-4 μm is obtained. The advantages of the proposed masks are given. The possibilities of obtaining submicron imprints are discussed.
engineering, electrical & electronic,nanoscience & nanotechnology,instruments & instrumentation,physics, applied
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