Designing Barrier-Free Metal/MoS 2 Contacts through Electrene Insertion
Mohammad Rafiee Diznab,Adrian F. Rumson,Jesse Maassen,Erin R. Johnson
DOI: https://doi.org/10.1039/d3cp06112d
IF: 3.3
2024-04-24
Physical Chemistry Chemical Physics
Abstract:Transition-metal dichalcogenides (TMDCs), including MoS 2 , have great potential in electronics applications. However, achieving low-resistance metal contacts is a challenge that impacts their performance in nanodevices, due to strong Fermi-level pinning and the presence of a tunnelling barrier. As a solution, we explore a strategy of inserting monolayers of alkaline-earth sub-pnictide electrenes with a general formula of [M 2 X] + e - (M = Ca, Sr, Ba; X = N, P, As, Sb) between the TMDC and the metal. These electrenes possess two-dimensional sheets of charge on their surfaces that can be readily donated when interfaced with a TMDC semiconductor, thereby lowering its conduction band below the Fermi level and eliminating the Schottky and tunnelling barriers. In this work, density-functional theory (DFT) calculations were performed for metal/electrene/MoS 2 heterojunctions for all stable M 2 X electrenes and both Au and Cu metals. To identify the material combinations that provide the most effective Ohmic contact, the charge transfer, band structure, and electrostatic potential were computed. In all cases, a linear correlation was found between the charge donated to the MoS 2 and both the electrene surface charge and work function. Overall, Ca 2 N appears to be the most promising electrene for achieving an Ohmic metal/MoS 2 contact, due to its high surface charge density.
chemistry, physical,physics, atomic, molecular & chemical