Mask correction method for surface plasmon lithography

Le Ma,Libin Zhang,Jianfang He,Huwen Ding,Yayi Wei

DOI: https://doi.org/10.1364/ao.509520

IF: 1.9

2024-01-09

Applied Optics

Abstract:Le Ma, Libin Zhang, Jianfang He, Huwen Ding, Yayi Wei Surface plasmon lithography (SPL) has emerged as an innovative approach to nano-fabrication, offering an alternative to traditional ... [Appl. Opt. 63, 499-505 (2024)]

optics

What problem does this paper attempt to address?

Laser Direct Writing Technology for Printing Mesh on Convex Surface

Hu Neibin,Bai Jian,Mo Honglei,Zhu Beibei,Lan Jie,Liang Yiyong

DOI: https://doi.org/10.3788/irla201645.0120002

2016-01-01

Infrared and Laser Engineering

Abstract:In order to meet the requirement of convex surface mask in concave surface lithography, convex surface laser direct writing system was set up to fabricate the mask. This apparatus supported up to ±20°tilt angle. With the exposure correction algorithm in the process, the system accomplished writing rectangular grid pattern on a spherical substrate with 50 mm caliber and 51.64 mm radius. It was able to draw circular ring pattern on the surface by result of simultaneous motion of two tilting tables. The experiment shows that this setup has the capacity to fabricate the convex mesh lithographic mask and lay a solid base for convex surface lithography technology. ©2016, Editorial Board of Journal of Infrared and Laser Engineering. All right reserved.
Mask 3D parameter optimization for improving imaging contrast of plasmonic lithography

Jianfang He,Huwen Ding,Yayi Wei,Tianchun Ye

DOI: https://doi.org/10.1364/ao.518309

IF: 1.9

2024-06-13

Applied Optics

Abstract:Jianfang He, Huwen Ding, Yayi Wei, Tianchun Ye Based on plasmonic lithography (PL) technology, and aiming at the special nano-optical effect of metal/dielectric multilayer composites and ... [Appl. Opt. 63, 4809-4818 (2024)]

optics
Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures

Jiaxu Huang,Kang Xu,Jin Hu,Dandan Yuan,Jun Li,Jingyu Qiao,Shaolin Xu

DOI: https://doi.org/10.1021/acs.nanolett.2c01740

IF: 10.8

2022-07-19

Nano Letters

Abstract:This paper proposes a one-step maskless 2D nanopatterning approach named self-aligned plasmonic lithography (SPL) by line-shaped ultrafast laser ablation under atmospheric conditions for the first time. Through a theoretical calculation of electric field and experimental verification, we proved that homogeneous interference of laser-excited surface plasmon polaritons (SPPs) can be achieved and used to generate long-range ordered 2D nanostructures in a self-aligned way over a wafer-sized area...

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

Jiaxin Ji,Jiying Chen,Pengfei Xu,Jing Li,Yueqiang Hu,Yonggang Meng

DOI: https://doi.org/10.1063/1.5113813

IF: 2.877

2019-01-01

Journal of Applied Physics

Abstract:Rotational near-field photolithography exposes photoresists by exciting surface plasmon polaritons to realize nanopatterns with ultrahigh-resolution beyond the diffraction limit. This feature enables broad application prospects in the micro-nanomanufacturing field. The lithography flight head, carrying a plasmonic lens (PL), with an approximately 10 nm spacer from the substrate, is the core of the system for effective etching. This paper investigates the flight state of a PL-loaded lithography head on the air film, based on computational fluid dynamics analysis. We found that the influence of the PL on the flight height produces an edge effect. This means that a PL fabricated on the edge region can significantly affect the flight height of the head. By processing the PL at a distance of 10 μm from the edge of the slider tail block, a steady 37 nm linewidth depth pattern was finally realized, using a rotational near-field photolithography system.
Edge-based near-field photolithography optical proximity effect correction technique

Jiaxin Ji,Bin Wei,Guangjuan Wen,Zhongwen Lin

DOI: https://doi.org/10.1007/s11082-024-07765-x

IF: 3

2024-11-04

Optical and Quantum Electronics

Abstract:Near-field photolithography can use surface plasmon polaritons to surpass the traditional optical diffraction limit, thus removing the limitation imposed by the light source wavelength on traditional photolithography resolution. However, the optical proximity effect causes uneven patterns produced by near-field photolithography, resulting in significant deviations from the target pattern. This work employs edge-based near-field photolithography optical proximity effect correction technology to optimize mask patterns to resolve the issue of imaging distortion in near-field photolithography. Firstly, a near-field photolithography exposure model is established in Ansys-FDTD software, and based on this model, the optical proximity effect is analyzed using transfer matrix theory and distribution of electric field energy. Secondly, the designed mask pattern is fed into the exposure model to obtain the exposed pattern outline. Therefore, an edge-based compensation rule is proposed to optimize the pattern based on the trend of contour errors. Finally, the mask with the optimized pattern is prepared using near-field imaging photolithography for comparison experiments. According to the experimental results, the optimized mask improves the similarity of photolithography patterns by 34.7% and reduces the average corner error rate by 61.7%. Thus, the optimized imaging mask significantly reduces distortion in photolithography patterns.

engineering, electrical & electronic,optics,quantum science & technology
248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Man-man Tian,Jia-jia Mi,Jian-ping Shi,Nan-nan Wei,Ling-li Zhan,Wan-xia Huang,Ze-wen Zuo,Chang-tao Wang,Xian-gang Luo

DOI: https://doi.org/10.1007/s11801-014-3172-1

2014-01-01

Abstract:A new photolithography technique for 248 nm based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations.The basic structure consists of surface plasmon polariton（SPP）interference mask and multi-layer film superlens.Using the amplification effect of superlens on evanescent wave,the near field SPP interference pattern is imaged to the far field,and then is exposed on photo resist（PR）.The simulation results based on finite difference time domain（FDTD）method show that the full width at half maximum（FWHM）of the interference pattern is about 19 nm when the p-polarization light from 248 nm source is vertically incident to the structure.Meanwhile,the focal depth is 150 nm for negative PR and 60 nm for positive PR,which is much greater than that in usual SPP photolithography.
Mask-Moving-Lithography-Based High-Precision Surface Fabrication Method for Microlens Arrays

Jianwen Gong,Ji Zhou,Junbo Liu,Song Hu,Jian Wang,Haifeng Sun

DOI: https://doi.org/10.3390/mi15020289

IF: 3.4

2024-02-20

Micromachines

Abstract:Microlens arrays, as typical micro-optical elements, effectively enhance the integration and performance of optical systems. The surface shape errors and surface roughness of microlens arrays are the main indicators of their optical characteristics and determine their optical performance. In this study, a mask-moving-projection-lithography-based high-precision surface fabrication method for microlens arrays is proposed, which effectively reduces the surface shape errors and surface roughness of microlens arrays. The pre-exposure technology is used to reduce the development threshold of the photoresist, thus eliminating the impact of the exposure threshold on the surface shape of the microlens. After development, the inverted air bath reflux method is used to bring the microlens array surface to a molten state, effectively eliminating surface protrusions. Experimental results show that the microlens arrays fabricated using this method had a root mean square error of less than 2.8%, and their surface roughness could reach the nanometer level, which effectively improves the fabrication precision for microlens arrays.

chemistry, analytical,nanoscience & nanotechnology,instruments & instrumentation,physics, applied
Surface-plasmon-assisted nanoscale photolithography by polarized light

D. B. Shao,S. C. Chen

DOI: https://doi.org/10.1063/1.1951052

IF: 4

2005-06-20

Applied Physics Letters

Abstract:We demonstrate that photolithography can be extended to a subwavelength resolution for patterning of virtually any substrate by exciting surface plasmons on both a metallic mask and a substrate. Without any additional equipment or added complexity to mask design, one-to-one pattern transfer has been achieved. In this letter, a polarized laser beam of 355 nm wavelength was used as light source to photoinitiate an 80 nm thick photoresist on a silicon substrate coated with titanium of 80 nm thick. Array of line apertures of 100 nm in width were made on gold film or titanium film deposited on a quartz substrate, serving as the mask. Simulation results by finite-difference time-domain method have shown that surface plasmons excited on both the metallic mask and the Ti shield help to spatially confine the light behind the apertures. Experimental results show a strong dependence of pattern transfer on the polarization of light as well as the energy dosage of the light. The feature size using such method could be further scaled down, limited theoretically by the validity of the dielectric function of the material, and practically by the fabrication of the mask.

physics, applied
Subwavelength Nanolithography Based on Unidirectional Excitation of Surface Plasmons

Ting Xu,Liang Fang,Beibei Zeng,Yao Liu,Changtao Wang,Qin Feng,Xiangang Luo

DOI: https://doi.org/10.1088/1464-4258/11/8/085003

2009-01-01

Abstract:A subwavelength nanolithography technique based on unidirectional excitation of surface plasmons is proposed and numerically demonstrated by finite-difference time-domain analysis. Normal incident light impinging on a specially designed mask can excite two unidirectional surface plasmon waves (SPWs) with counter propagating directions on the unilluminated side. The simulation results show that the interference of these face-to-face SPWs launched by the mask could deliver about 50 nm half-pitch patterns at the operating wavelength of 365 nm, going far beyond the free space diffraction limit. This technique provides an effective fabrication method for nanostructures.
Plasmonic lithography fast imaging model based on least square fitting for periodic patterns

Huwen Ding,Lisong Dong,Ziqi Li,Jianfang He,Le Ma,Dinghai Rui,Yayi Wei

DOI: https://doi.org/10.1364/ao.533329

IF: 1.9

2024-11-08

Applied Optics

Abstract:Huwen Ding, Lisong Dong, Ziqi Li, Jianfang He, Le Ma, Dinghai Rui, Yayi Wei As a new and alternative lithography technology, plasmonic lithography can break through the diffraction limit of traditional lithography ... [Appl. Opt. 63, 8454-8464 (2024)]

optics
Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

Yunxiang Li,Fang Liu,Long Xiao,Kaiyu Cui,Xue Feng,Wei Zhang,Yidong Huang

DOI: https://doi.org/10.1063/1.4792591

IF: 4

2013-01-01

Applied Physics Letters

Abstract:We propose and demonstrate the two-surface-plasmon-polariton-absorption (TSPPA), which is a nonlinear effect by absorbing two surface-plasmon-polaritons (SPPs), as well as a nanolithography technique based on TSPPA. The TSPPA effect is verified with the plasmonic interference structure to exclude the possibility of two photon absorption. Benefiting from the short wavelength and the field enhancement of SPP as well as the selective transfer of plasmonic patterns into photoresist induced by TSPPA, resist strips with the linewidth of ∼λ0/11 are achieved by a single illumination on the plasmonic mask with the femtosecond laser for only 15 s, which shows great potential for future large-area nanolithography.
Digital inverse patterning solutions for fabrication of high-fidelity microstructures in spatial light modulator (SLM)-based projection lithography

jing chen,Yuan-Yuan Zhao,Jianxin Zhu,xuan-ming duan

DOI: https://doi.org/10.1364/oe.502063

IF: 3.8

2024-02-14

Optics Express

Abstract:Jing-Tao Chen, Yuan-Yuan Zhao, Jian-Xin Zhu, Xuan-Ming Duan Digital mask projection lithography (DMPL) technology is gaining significant attention due to its characteristics of free-mask, ... [Opt. Express 32, 6800-6813 (2024)]

optics
Plasmonic Interference Lithography Based on the Second-Order Diffracted Wave of Grating and Hyperbolic Multilayer Graphene

Yu Long,Hui Zhong,Xin Chen,Ye Tian,Ruxin Li

DOI: https://doi.org/10.1364/optcon.513843

2024-01-01

Optics Continuum

Abstract:Surface plasmon interference lithography (SPIL), which can break the diffraction limit to achieve a large area deep subwavelength resolution, has great application potential in the field of micro-nano manufacturing. However, considering the characteristics of the intensity of each order diffraction wave and the rapid attenuation of surface plasmon polariton (SPP) intensity, most of the current work uses the first order diffraction wave of grating to stimulate SPP. According to the matching conditions, the half-pitch resolution of the interference pattern is 1/4 of the grating period, which makes the method still have high requirements for the mask period. In addition, the intimate contact relationship between each layer limits the reuse of the mask, which ultimately limits the development of SPIL. To address these issues, plasmonic interference lithography based on the second-order diffracted wave of grating and hyperbolic multilayer graphene is proposed. Simulation results show that structures with air gaps can obtain interference patterns with a half-pitch resolution of 1/8 of the grating period and 1/6.7 of incident wavelength, as well as maintaining the characteristic of the insensitive to photoresist (PR) thickness.
High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Yueqiang Hu,Ling Li,Rong Wang,Jian Song,Hongdong Wang,Huigao Duan,Jiaxin Ji,Yonggang Meng

DOI: https://doi.org/10.1016/j.eng.2020.08.019

IF: 12.834

2021-01-01

Engineering

Abstract:Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping. Lithography in the near field using the surface plasmon polariton (i.e., plasmonic lithography) provides a promising solution. The system with high stiffness passive nanogap control strategy on a high-speed rotating substrate is one of the most attractive high-throughput methods. However, a smaller and steadier plasmonic nanogap, new scheme of plasmonic lens, and parallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabrication. Herein, a parallel plasmonic direct-writing nanolithography system is established in which a novel plasmonic flying head is systematically designed to achieve around 15 nm minimum flying-height with high parallelism at the rotating speed of 8–18 m·s−1. A multi-stage metasurface-based polarization insensitive plasmonic lens is proposed to couple more power and realize a more confined spot compared with conventional plasmonic lenses. Parallel lithography of the nanostructures with the smallest (around 26 nm) linewidth is obtained with the prototyping system. The proposed system holds great potential for high-freedom nanofabrication with low cost, such as planar optical elements and nano-electromechanical systems.
Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation

Dandan Han,Sen Deng,Tianchun Ye,Yayi Wei

DOI: https://doi.org/10.1038/s41378-023-00512-4

2023-03-30

Microsystems & Nanoengineering

Abstract:Abstract Plasmonic lithography, which uses the evanescent electromagnetic (EM) fields to generate image beyond the diffraction limit, has been successfully demonstrated as an alternative lithographic technology for creating sub-10 nm patterns. However, the obtained photoresist pattern contour in general exhibits a very poor fidelity due to the near-field optical proximity effect (OPE), which is far below the minimum requirement for nanofabrication. Understanding the near-field OPE formation mechanism is important to minimize its impact on nanodevice fabrication and improve its lithographic performance. In this work, a point-spread function (PSF) generated by a plasmonic bowtie-shaped nanoaperture (BNA) is employed to quantify the photon-beam deposited energy in the near-field patterning process. The achievable resolution of plasmonic lithography has successfully been enhanced to approximately 4 nm with numerical simulations. A field enhancement factor ( F ) as a function of gap size is defined to quantitatively evaluate the strong near-field enhancement effect excited by a plasmonic BNA, which also reveals that the high enhancement of the evanescent field is due to the strong resonant coupling between the plasmonic waveguide and the surface plasmon waves (SPWs). However, based on an investigation of the physical origin of the near-field OPE, and the theoretical calculations and simulation results indicate that the evanescent-field-induced rapid loss of high- k information is one of the main optical contributors to the near-field OPE. Furthermore, an analytic formula is introduced to quantitatively analyze the effect of the rapidly decaying feature of the evanescent field on the final exposure pattern profile. Notably, a fast and effective optimization method based on the compensation principle of the exposure dose is proposed to reduce the pattern distortion by modulating the exposure map with dose leveling. The proposed pattern quality enhancement method can open new possibilities in the manufacture of nanostructures with ultrahigh pattern quality via plasmonic lithography, which would find potentially promising applications in high density optical storage, biosensors, and plasmonic nanofocusing.

nanoscience & nanotechnology,instruments & instrumentation
Lithography mask thermal and stress effect for the machine overlay compensation

Dinghai Rui,Libin Zhang,Hao Shen,Huwen Ding,Shuang Liu,Yayi Wei,Yajuan Su

DOI: https://doi.org/10.1116/6.0003693

2024-07-01

Abstract:With the continuous advancement of integrated circuit technology nodes, the degree of chip integration is increasing, and the requirements for critical dimensions and overlay errors are becoming more and more stringent. In recent years, near-field lithography technologies such as nanoimprint lithography and plasmonic lithography have made rapid progress; however, the challenge of compensating for their overlay has yet to be solved or systematic reports are lacking. This work offers an overlay compensation approach based on the theory of overlay and mask stress mechanics and thermodynamics by providing stress to the mask. The overlay analysis model and correction feedback mechanism based on mask compensation technology is carried out theoretically. This work establishes the relationship between the overlay compensation parameters and the mask stress by using strict calculation methods, quantitative characterization, and combining sensitivity analysis methods. Theoretical verification of various overlay distribution patterns demonstrates the efficiency of this feedback compensation strategy as well as the quantitative analytical calculation. It is verified that, under ideal conditions, the feedback technique may minimize the overlay error caused by mask thermal effects to ∼1.5 nm. This research presents a quantitative control mechanism for reducing overlay for near-field lithography, and it has substantial guiding implications for traditional lithography quantitative research on the influence of mask stress or temperature on overlay.
Contrast-Enhancing Polarization Control Method for Surface Plasmon Imaging Sensor

Zihao Huang,Xiaoping Wang,Shuyue Zhan,Xu Liu

DOI: https://doi.org/10.1117/1.oe.51.9.094402

IF: 1.3

2012-01-01

Optical Engineering

Abstract:Based on the surface plasmon resonance (SPR) polarization control theory, a prism polarization control method is proposed. The method works by suppressing the light reflected from the bare prism used for high-throughput SPR array sensors. The contrast of SPR imaging sensors can be enhanced while maintaining high sensitivity. The effects of the proposed method on sensor performance, which is attributable to parameters such as incident angle, wavelength, polarizer angle, and gold film thickness, are analyzed to determine the best set of parameters. The effects of parameter errors on the SPR curve are also simulated and compared with those of the gold film polarization control method. Finally, an experiment is set up to validate the theoretical analysis and provide a solid foundation for the design of a high-sensitivity SPR imaging sensor. (C) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.OE.51.9.094402]
Ultra-pixel precision correction method for maskless lithography projection distortion

Long Huang,Yu-Qing Liu,Shaoqing Zhao,Yuxuan Cong,Dechun Zhou,Liu Zhang,Yongjun Dong,Hua Liu

DOI: https://doi.org/10.1364/oe.534439

IF: 3.8

2024-10-15

Optics Express

Abstract:Long Huang, Yu-Qing Liu, Shaoqing Zhao, Yuxuan Cong, Dechun Zhou, Liu Zhang, Yongjun Dong, Hua Liu Distortion is a common issue in projection lens imaging, leading to image distortion and edge deformation, which significantly affects the ... [Opt. Express 32, 39208-39221 (2024)]

optics
Numerical study of the plasmonic slab lens for improving direct-write nano lithography

Ruiguang Peng,Jiacong Lin,Yan Meng,Shijia Feng,Tao Lin,Kai Gao,Yuner Gan,Qian Zhao,Ming Zhou

DOI: https://doi.org/10.1364/oe.515048

IF: 3.8

2024-01-25

Optics Express

Abstract:Ruiguang Peng, Jiacong Lin, Yan Meng, Shijia Feng, Tao Lin, Kai Gao, Yuner Gan, Qian Zhao, Ming Zhou Plasmonic direct-write lithography (PDWL) provides a potential tool for the fabrication and manufacturing at the nano scale due to its ... [Opt. Express 32, 4189-4200 (2024)]

optics
Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Hongchao Liu,Weijie Kong,Qionggan Zhu,Yun Zheng,Kesheng Shen,Jun Zhang,Hai Lu

DOI: https://doi.org/10.1088/1361-6463/ab6430

2020-01-01

Journal of Physics D Applied Physics

Abstract:Plasmonic lithography based on surface plasmon polariton has been proven to breaking the diffraction limit and deliver the super-resolution patterns. However, most previously reported studies suffer from the low energy efficiency and subwavelength excitation grating that obstructs the application in nanofabrication. In this work, a special plasmonic lithography prototype is proposed based on the coupling of the bulk plasmon polariton mode squeezed through the hyperbolic metamaterial (HMM) and the waveguide mode supported in the coupling layer/HMM/photoresist sandwich structure. The results demonstrate that periodic patterns with strong lithography light intensity (>220%) over the whole photoresist layer compared with incident optical intensity, high aspect ratios (1.5:1) and a half-pitch of 57.5 nm can be generated, under the interference of the fourth-order diffracted light of grating. The lithography linewidth can reach 1/16 of the mask period of 920 nm and similar to 1/8 of the wavelength of the 436 nm illumination light. This design of period reduction makes the device fabrication much easier, costless and even exhibits good tolerance to the roughness of the multilayer. In addition, theoretical analyses performed are widely applicable to systems working at other ultraviolet wavelengths including 248, 365 and 405 nm.

Mask correction method for surface plasmon lithography

Laser Direct Writing Technology for Printing Mesh on Convex Surface

Mask 3D parameter optimization for improving imaging contrast of plasmonic lithography

Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

Edge-based near-field photolithography optical proximity effect correction technique

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Mask-Moving-Lithography-Based High-Precision Surface Fabrication Method for Microlens Arrays

Surface-plasmon-assisted nanoscale photolithography by polarized light

Subwavelength Nanolithography Based on Unidirectional Excitation of Surface Plasmons

Plasmonic lithography fast imaging model based on least square fitting for periodic patterns

Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

Digital inverse patterning solutions for fabrication of high-fidelity microstructures in spatial light modulator (SLM)-based projection lithography

Plasmonic Interference Lithography Based on the Second-Order Diffracted Wave of Grating and Hyperbolic Multilayer Graphene

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation

Lithography mask thermal and stress effect for the machine overlay compensation

Contrast-Enhancing Polarization Control Method for Surface Plasmon Imaging Sensor

Ultra-pixel precision correction method for maskless lithography projection distortion

Numerical study of the plasmonic slab lens for improving direct-write nano lithography

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode