Mask 3D parameter optimization for improving imaging contrast of plasmonic lithography

Jianfang He,Huwen Ding,Yayi Wei,Tianchun Ye

DOI: https://doi.org/10.1364/ao.518309

IF: 1.9

2024-06-13

Applied Optics

Abstract:Jianfang He, Huwen Ding, Yayi Wei, Tianchun Ye Based on plasmonic lithography (PL) technology, and aiming at the special nano-optical effect of metal/dielectric multilayer composites and ... [Appl. Opt. 63, 4809-4818 (2024)]

optics

What problem does this paper attempt to address?

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

Jiaxin Ji,Jiying Chen,Pengfei Xu,Jing Li,Yueqiang Hu,Yonggang Meng

DOI: https://doi.org/10.1063/1.5113813

IF: 2.877

2019-01-01

Journal of Applied Physics

Abstract:Rotational near-field photolithography exposes photoresists by exciting surface plasmon polaritons to realize nanopatterns with ultrahigh-resolution beyond the diffraction limit. This feature enables broad application prospects in the micro-nanomanufacturing field. The lithography flight head, carrying a plasmonic lens (PL), with an approximately 10 nm spacer from the substrate, is the core of the system for effective etching. This paper investigates the flight state of a PL-loaded lithography head on the air film, based on computational fluid dynamics analysis. We found that the influence of the PL on the flight height produces an edge effect. This means that a PL fabricated on the edge region can significantly affect the flight height of the head. By processing the PL at a distance of 10 μm from the edge of the slider tail block, a steady 37 nm linewidth depth pattern was finally realized, using a rotational near-field photolithography system.
Fast and Efficient Inverse Design Framework for Multifunctional Metalenses

Xixian Zu,Xiaoyu Sun,Wei Yan,Wei E. I. Sha,Min Qiu

DOI: https://doi.org/10.1002/lpor.202400886

2024-01-01

LASER & PHOTONICS REVIEWS

Abstract:Over the past years, nanostructured metalenses with thin form factors have been extensively studied for their potential in consumer and industrial applications. Despite significant advancements, current metalenses struggle to achieve high numerical aperture (NA), manufacturable structures, broad working bandwidth, and extended depth of focus (DOF) simultaneously. This paper introduces a comprehensive inverse design framework that facilitates the rapid development of polarization-insensitive 3D metalenses, effective in both frequency and spatial domains. The framework employs shape-constrained topology optimization to define horizontal ring profiles, along with discrete particle swarm optimization to manage discretized ring heights. Two immersed silicon carbide metalenses are demonstrated to showcase this framework's capability, providing near-unity NAs for enhanced photon collection. The first design is an extended DOF metalens, exhibiting a DOF over four times the light wavelength and achieving a maximum diffraction efficiency of 23%, close to the theoretical limit. The second design achieves broadband achromaticity, suppressing chromatic aberrations across a wide 300 nm bandwidth (850-1150 nm) while maintaining an average diffraction efficiency of 10%. This methodology serves as a valuable tool for deploying functional metalenses with implications for nanophotonics, quantum optics, and quantum nanotechnology. An effective inverse design framework for polarization-insensitive 3D metalenses, optimized for frequency and spatial domains is introduced. Using shape-constrained topology optimization and discrete particle swarm optimization, silicon carbide metalenses with extended-depth-of-focus and broadband achromaticity is developed across a 300 nm bandwidth, achieving maximum diffraction efficiencies of 23% and 13.6%, respectively. These designs have promising applications in nanophotonics and quantum optics. image
Mask correction method for surface plasmon lithography

Le Ma,Libin Zhang,Jianfang He,Huwen Ding,Yayi Wei

DOI: https://doi.org/10.1364/ao.509520

IF: 1.9

2024-01-09

Applied Optics

Abstract:Le Ma, Libin Zhang, Jianfang He, Huwen Ding, Yayi Wei Surface plasmon lithography (SPL) has emerged as an innovative approach to nano-fabrication, offering an alternative to traditional ... [Appl. Opt. 63, 499-505 (2024)]

optics
Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation

Dandan Han,Sen Deng,Tianchun Ye,Yayi Wei

DOI: https://doi.org/10.1038/s41378-023-00512-4

2023-03-30

Microsystems & Nanoengineering

Abstract:Abstract Plasmonic lithography, which uses the evanescent electromagnetic (EM) fields to generate image beyond the diffraction limit, has been successfully demonstrated as an alternative lithographic technology for creating sub-10 nm patterns. However, the obtained photoresist pattern contour in general exhibits a very poor fidelity due to the near-field optical proximity effect (OPE), which is far below the minimum requirement for nanofabrication. Understanding the near-field OPE formation mechanism is important to minimize its impact on nanodevice fabrication and improve its lithographic performance. In this work, a point-spread function (PSF) generated by a plasmonic bowtie-shaped nanoaperture (BNA) is employed to quantify the photon-beam deposited energy in the near-field patterning process. The achievable resolution of plasmonic lithography has successfully been enhanced to approximately 4 nm with numerical simulations. A field enhancement factor ( F ) as a function of gap size is defined to quantitatively evaluate the strong near-field enhancement effect excited by a plasmonic BNA, which also reveals that the high enhancement of the evanescent field is due to the strong resonant coupling between the plasmonic waveguide and the surface plasmon waves (SPWs). However, based on an investigation of the physical origin of the near-field OPE, and the theoretical calculations and simulation results indicate that the evanescent-field-induced rapid loss of high- k information is one of the main optical contributors to the near-field OPE. Furthermore, an analytic formula is introduced to quantitatively analyze the effect of the rapidly decaying feature of the evanescent field on the final exposure pattern profile. Notably, a fast and effective optimization method based on the compensation principle of the exposure dose is proposed to reduce the pattern distortion by modulating the exposure map with dose leveling. The proposed pattern quality enhancement method can open new possibilities in the manufacture of nanostructures with ultrahigh pattern quality via plasmonic lithography, which would find potentially promising applications in high density optical storage, biosensors, and plasmonic nanofocusing.

nanoscience & nanotechnology,instruments & instrumentation
Optimization Design and Fabrication of Plasmonic Lens for Near-Field Lithography

Song Nanhai,Meng Yonggang

DOI: https://doi.org/10.13494/j.npe.2013.012

2013-01-01

Nanotechnology and Precision Engineering

Abstract:Plasmonic lens(PL) is widely applicable due to its superfocusing of the incident beam to generate a near-field spot whose size is beyond the diffraction limit.In order to obtain a smaller near-field spot,shorter incident wavelength should be used.As a result,355 nm radially polarized laser beam was used as the incident condition in the simulation experiments using a commercial software(COMSOL multiphysics).In the simulations,the structure parameters of PL with concentric metallic slots were optimized.The results show that when the radius of the first-slot and the pitch of the concentric slots are equal to the surface plasmon polaritons(SPPs) wavelength,and the slot number is increased at the same time,SPPs excited by the slots will propagate to and interfere at the PL center,hence higher field enhancement is obtained.With the increase of the metallic film thickness and slot width,the intensity at the PL center increases at first and then decreases,so the optimal value can be found.Based on the optimization,focused ion beam(FIB) was used to fabricate the proposed PL structure with high accuracy,except for the tapered side wall of the slots.However,as indicated by further simulation results,the tapered side wall has little influence on the superfocusing and the field enhancement of PL.
Plasmonic lithography fast imaging model based on least square fitting for periodic patterns

Huwen Ding,Lisong Dong,Ziqi Li,Jianfang He,Le Ma,Dinghai Rui,Yayi Wei

DOI: https://doi.org/10.1364/ao.533329

IF: 1.9

2024-11-08

Applied Optics

Abstract:Huwen Ding, Lisong Dong, Ziqi Li, Jianfang He, Le Ma, Dinghai Rui, Yayi Wei As a new and alternative lithography technology, plasmonic lithography can break through the diffraction limit of traditional lithography ... [Appl. Opt. 63, 8454-8464 (2024)]

optics
Optimize projected mask images for improving three-dimensional printing accuracy for digital light processing based vat photopolymerization

Yifan Wang,Yanan Zhang,Haiyi Liang,Xingyue Sun

DOI: https://doi.org/10.1016/j.addma.2024.104257

IF: 11

2024-06-20

Additive Manufacturing

Abstract:Additive manufacturing technology, specifically digital light processing (DLP) based vat photopolymerization (VPP), is extensively employed for fabricating complex constructs. Nevertheless, the accuracy of DLP-VPP is hindered by challenges such as light diffraction during propagation and light penetration along the exposure axis within the photopolymeric resin. To mitigate these issues, regulating the grayscale of projected mask images offers a reliable approach to reduce undesired curing. In this study, we introduce a voxel-based multi-layer solidification model to predict the exposure dose distribution of printed parts. Based on this model, we propose a pixel-level grayscale optimization method using the gradient descent technique. This method allows us to control the accumulated exposure dose of each voxel by modifying the grayscale of individual pixels in the projected mask images, thereby improving the accuracy of the printed parts. To validate our optimization method, we conducted a series of experiments involving the printing of four representative structures using both the traditional method and our proposed optimization method. The results demonstrate that the structures produced using our optimization method exhibit superior consistency with the target geometry. This indicates a significant improvement in accuracy achieved through our optimization technique. Furthermore, our optimization method has successfully enabled the fabrication of microchannels that are previously unattainable using traditional method. This achievement highlights the immense potential of our optimization method in the realm of printing microchannels.

engineering, manufacturing,materials science, multidisciplinary
Optimization of Structure Parameters of Concentric Plasmonic Lens for 355 Nm Radially Polarized Illumination

Jiaxin Ji,Yonggang Meng,Jun Zhang

DOI: https://doi.org/10.1117/1.jnp.9.093794

IF: 1.179

2015-01-01

Journal of Nanophotonics

Abstract:We propose and optimize two designs of plasmonic lens structures, concentric grooves with a central hole (CGH) and concentric grooves with a central pillar (CGP), based on a traditional structure of concentric grooves (CG). The numerical investigation based on COMSOL Multiphysics is performed to optimize the three kinds of structures by a 355 nm radially polarized laser illumination. It is found that full-width at half maximum (FWHM) is closely related to the size of the center-position, and the field enhancement effect depends on the resonant wavelength of surface plasmon polaritons, permittivity, film thickness, and groove number. Compared to a FWHM of lambda/3 (lambda is the wavelength of the laser beam) with the conventional CG type, the combination of localized and extended surface plasmons results in CGP and CGH parameters achieving their optimal value with a much smaller spot size of lambda/8 and higher intensity enhancement for a variety of the aspect ratios of central pillar and hole. A focused ion beam was used to fabricate the three type nanostructures with high accuracy. The CGH type with a central hole 20.88 nm in diameter and the CGP type with a central pillar 55.45 nm in diameter have been successfully fabricated approximately to their optimization results. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Hongchao Liu,Weijie Kong,Qionggan Zhu,Yun Zheng,Kesheng Shen,Jun Zhang,Hai Lu

DOI: https://doi.org/10.1088/1361-6463/ab6430

2020-01-01

Journal of Physics D Applied Physics

Abstract:Plasmonic lithography based on surface plasmon polariton has been proven to breaking the diffraction limit and deliver the super-resolution patterns. However, most previously reported studies suffer from the low energy efficiency and subwavelength excitation grating that obstructs the application in nanofabrication. In this work, a special plasmonic lithography prototype is proposed based on the coupling of the bulk plasmon polariton mode squeezed through the hyperbolic metamaterial (HMM) and the waveguide mode supported in the coupling layer/HMM/photoresist sandwich structure. The results demonstrate that periodic patterns with strong lithography light intensity (>220%) over the whole photoresist layer compared with incident optical intensity, high aspect ratios (1.5:1) and a half-pitch of 57.5 nm can be generated, under the interference of the fourth-order diffracted light of grating. The lithography linewidth can reach 1/16 of the mask period of 920 nm and similar to 1/8 of the wavelength of the 436 nm illumination light. This design of period reduction makes the device fabrication much easier, costless and even exhibits good tolerance to the roughness of the multilayer. In addition, theoretical analyses performed are widely applicable to systems working at other ultraviolet wavelengths including 248, 365 and 405 nm.
High-fidelity fabrication of plasmonic nanoholes array via ion-beam planarization for extraordinary transmission applications

Qing Liu,Yiang Song,Pei Zeng,Chen Zhang,Yiqin Chen,Hanbing Wang,Yi Luo,Huigao Duan

DOI: https://doi.org/10.1016/j.apsusc.2020.146690

IF: 6.7

2020-10-01

Applied Surface Science

Abstract:<p>Plasmonic nanoholes are a kind of important building blocks for practical plasmonic applications due to their unique properties supporting extraordinary transmission and strong field enhancement. However, the reliable fabrication of plasmonic nanoholes with high-fidelity geometry, especially in thick metallic film, is still challenging with the current wet lift-off or focused-ion beam process. In this work, we demonstrate a process combining negative-tone electron-beam lithography, metal sputtering and flood ion-beam planarization to reliably fabricate plasmonic nanoholes. Compared to existing lift-off process, it has the advantages of 100% yield, uniform geometry and smooth structural edges. In contrast to focused-ion beam process, the current approach has apparently higher throughput and structural fidelity. Plasmonic nanoholes with different geometries, materials and sizes are reliably fabricated to demonstrate the advantages of this approach. The extraordinary transmission properties and their potential for refractive-index sensing are also demonstrated. This lithography-deposition-planarization strategy can also be extended to fabricate other optical structures such as optical metasurfaces and X-ray zone-plates.</p>

chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Yueqiang Hu,Ling Li,Rong Wang,Jian Song,Hongdong Wang,Huigao Duan,Jiaxin Ji,Yonggang Meng

DOI: https://doi.org/10.1016/j.eng.2020.08.019

IF: 12.834

2021-01-01

Engineering

Abstract:Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping. Lithography in the near field using the surface plasmon polariton (i.e., plasmonic lithography) provides a promising solution. The system with high stiffness passive nanogap control strategy on a high-speed rotating substrate is one of the most attractive high-throughput methods. However, a smaller and steadier plasmonic nanogap, new scheme of plasmonic lens, and parallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabrication. Herein, a parallel plasmonic direct-writing nanolithography system is established in which a novel plasmonic flying head is systematically designed to achieve around 15 nm minimum flying-height with high parallelism at the rotating speed of 8–18 m·s−1. A multi-stage metasurface-based polarization insensitive plasmonic lens is proposed to couple more power and realize a more confined spot compared with conventional plasmonic lenses. Parallel lithography of the nanostructures with the smallest (around 26 nm) linewidth is obtained with the prototyping system. The proposed system holds great potential for high-freedom nanofabrication with low cost, such as planar optical elements and nano-electromechanical systems.
High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Jiaxin Ji,Pengfei Xu,Jiying Chen,Jing Li,Yonggang Meng

DOI: https://doi.org/10.1007/s11468-019-01026-4

IF: 2.726

2019-01-01

Plasmonics

Abstract:Rotational near-field photolithography uses one or an array of plasmonic lenses to directly pattern features on a rotating substrate that is coated with a very sensitive photoresist. Critical for this method is its limited etching depth. We investigate and demonstrate that the depth-of-field of the so-obtained nanopatterns is determined by both the refractive index and the thickness of the air/photoresist multi-dielectric layer. Using the transfer-matrix theory, the bounded air/photoresist dielectric layer refracts the light at the interface, which causes the constructive interference of surface plasmon polaritons (SPPs) to be confined. The wavelength of the SPPs decreases with increasing photoresist thickness. Both the simulation and experiment indicate that high depth-of-field nanostructures can be obtained by optimizing the resonance wavelength of SPPs due to the response of the system. Combining this with high-speed rotational near-field photolithography technology, we find that nanostructures with four times the depth-of-field compared with the previous off-resonance system can be obtained using organic photoresists with this optimization.
Edge-based near-field photolithography optical proximity effect correction technique

Jiaxin Ji,Bin Wei,Guangjuan Wen,Zhongwen Lin

DOI: https://doi.org/10.1007/s11082-024-07765-x

IF: 3

2024-11-04

Optical and Quantum Electronics

Abstract:Near-field photolithography can use surface plasmon polaritons to surpass the traditional optical diffraction limit, thus removing the limitation imposed by the light source wavelength on traditional photolithography resolution. However, the optical proximity effect causes uneven patterns produced by near-field photolithography, resulting in significant deviations from the target pattern. This work employs edge-based near-field photolithography optical proximity effect correction technology to optimize mask patterns to resolve the issue of imaging distortion in near-field photolithography. Firstly, a near-field photolithography exposure model is established in Ansys-FDTD software, and based on this model, the optical proximity effect is analyzed using transfer matrix theory and distribution of electric field energy. Secondly, the designed mask pattern is fed into the exposure model to obtain the exposed pattern outline. Therefore, an edge-based compensation rule is proposed to optimize the pattern based on the trend of contour errors. Finally, the mask with the optimized pattern is prepared using near-field imaging photolithography for comparison experiments. According to the experimental results, the optimized mask improves the similarity of photolithography patterns by 34.7% and reduces the average corner error rate by 61.7%. Thus, the optimized imaging mask significantly reduces distortion in photolithography patterns.

engineering, electrical & electronic,optics,quantum science & technology
Digital inverse patterning solutions for fabrication of high-fidelity microstructures in spatial light modulator (SLM)-based projection lithography

jing chen,Yuan-Yuan Zhao,Jianxin Zhu,xuan-ming duan

DOI: https://doi.org/10.1364/oe.502063

IF: 3.8

2024-02-14

Optics Express

Abstract:Jing-Tao Chen, Yuan-Yuan Zhao, Jian-Xin Zhu, Xuan-Ming Duan Digital mask projection lithography (DMPL) technology is gaining significant attention due to its characteristics of free-mask, ... [Opt. Express 32, 6800-6813 (2024)]

optics
Strong Focusing of Plasmonic Lens with Nanofinger and Multiple Concentric Rings under Radially Polarized Illumination

Jiaxin Ji,Yonggang Meng,Lin Sun,Xiaoyu Wu,Jia Wang

DOI: https://doi.org/10.1007/s11468-015-0015-2

IF: 2.726

2015-01-01

Plasmonics

Abstract:The strong focusing and field enhancement effects of a metal nanofinger surrounded by multiple concentric rings are investigated through both COMSOL Multiphysics and finite-difference time-domain (FDTD) simulations. The aspect ratio of the nanofinger is the main parameter determining the full width at half maximum (FWHM) and the strong local field enhancement. The optimal values of the aspect ratio for the maximal enhancement and minimal FWHM are close to 1.8 and 3.0, respectively. Furthermore, the optimal aspect ratio of maximal field enhancement intensity decreases linearly with the incident wavelength, and the optimal aspect ratio of minimal FWHM increases linearly with the metal film thickness. The nanofinger fabricated with the focused ion beam method has a small conical angle, which results in a higher field enhancement and smaller focal spot size than straight sidewall finger. However, the shorter finger defect deteriorates FWHM and field enhancement because of the bias from the optimal aspect ratio value.
Numerical study of the plasmonic slab lens for improving direct-write nano lithography

Ruiguang Peng,Jiacong Lin,Yan Meng,Shijia Feng,Tao Lin,Kai Gao,Yuner Gan,Qian Zhao,Ming Zhou

DOI: https://doi.org/10.1364/oe.515048

IF: 3.8

2024-01-25

Optics Express

Abstract:Ruiguang Peng, Jiacong Lin, Yan Meng, Shijia Feng, Tao Lin, Kai Gao, Yuner Gan, Qian Zhao, Ming Zhou Plasmonic direct-write lithography (PDWL) provides a potential tool for the fabrication and manufacturing at the nano scale due to its ... [Opt. Express 32, 4189-4200 (2024)]

optics
Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy

Dandan Han,Tianchun Ye,Yayi Wei,Tian-chun Ye

DOI: https://doi.org/10.1039/d3na00147d

IF: 5.598

2023-01-01

Nanoscale Advances

Abstract:Nanolithography techniques providing a good scalability and feature size controllability are of great importance for the fabrication of integrated circuits (IC), MEMS/NEMS, optical devices, nanophotonics, etc. Herein, a cost-effective, easy...

materials science, multidisciplinary,nanoscience & nanotechnology,chemistry
Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial

Xi Chen,Cheng Zhang,Fan Yang,Gaofeng Liang,Qiaochu Li,L Jay Guo

DOI: https://doi.org/10.1021/acsnano.7b03584

IF: 17.1

2017-10-24

ACS Nano

Abstract:In this work, a special hyperbolic metamaterial (HMM) metamaterial is investigated for plasmonic lithography of period reduction patterns. It is a type II HMM (ϵ∥ < 0 and ϵ⊥ > 0) whose tangential component of the permittivity ϵ∥ is close to zero. Due to the high anisotropy of the type II epsilon-near-zero (ENZ) HMM, only one plasmonic mode can propagate horizontally with low loss in a waveguide system with ENZ HMM as its core. This work takes the advantage of a type II ENZ HMM composed of aluminum/aluminum oxide films and the associated unusual mode to expose a photoresist layer in a specially designed lithography system. Periodic patterns with a half pitch of 58.3 nm were achieved due to the interference of third-order diffracted light of the grating. The lines were 1/6 of the mask with a period of 700 nm and ∼1/7 of the wavelength of the incident light. Moreover, the theoretical analyses performed are widely applicable to structures made of different materials such as silver as well as systems working at deep ultraviolet wavelengths including 193, 248, and 365 nm.
Mask structure optimization for beyond EUV lithography

Ziqi Li,Lisong Dong,Xu Ma,Yayi Wei

DOI: https://doi.org/10.1364/ol.523596

IF: 3.6

2024-06-19

Optics Letters

Abstract:Ziqi Li, Lisong Dong, Ma Xu, Yayi Wei Beyond extreme ultraviolet (BEUV) lithography with a 6?×?nm wavelength is regarded as a future technique to continue the pattern ... [Opt. Lett. 49, 3604-3607 (2024)]

optics
Surface-plasmon-assisted nanoscale photolithography by polarized light

D. B. Shao,S. C. Chen

DOI: https://doi.org/10.1063/1.1951052

IF: 4

2005-06-20

Applied Physics Letters

Abstract:We demonstrate that photolithography can be extended to a subwavelength resolution for patterning of virtually any substrate by exciting surface plasmons on both a metallic mask and a substrate. Without any additional equipment or added complexity to mask design, one-to-one pattern transfer has been achieved. In this letter, a polarized laser beam of 355 nm wavelength was used as light source to photoinitiate an 80 nm thick photoresist on a silicon substrate coated with titanium of 80 nm thick. Array of line apertures of 100 nm in width were made on gold film or titanium film deposited on a quartz substrate, serving as the mask. Simulation results by finite-difference time-domain method have shown that surface plasmons excited on both the metallic mask and the Ti shield help to spatially confine the light behind the apertures. Experimental results show a strong dependence of pattern transfer on the polarization of light as well as the energy dosage of the light. The feature size using such method could be further scaled down, limited theoretically by the validity of the dielectric function of the material, and practically by the fabrication of the mask.

physics, applied

Mask 3D parameter optimization for improving imaging contrast of plasmonic lithography

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

Fast and Efficient Inverse Design Framework for Multifunctional Metalenses

Mask correction method for surface plasmon lithography

Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation

Optimization Design and Fabrication of Plasmonic Lens for Near-Field Lithography

Plasmonic lithography fast imaging model based on least square fitting for periodic patterns

Optimize projected mask images for improving three-dimensional printing accuracy for digital light processing based vat photopolymerization

Optimization of Structure Parameters of Concentric Plasmonic Lens for 355 Nm Radially Polarized Illumination

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

High-fidelity fabrication of plasmonic nanoholes array via ion-beam planarization for extraordinary transmission applications

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Edge-based near-field photolithography optical proximity effect correction technique

Digital inverse patterning solutions for fabrication of high-fidelity microstructures in spatial light modulator (SLM)-based projection lithography

Strong Focusing of Plasmonic Lens with Nanofinger and Multiple Concentric Rings under Radially Polarized Illumination

Numerical study of the plasmonic slab lens for improving direct-write nano lithography

Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy

Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial

Mask structure optimization for beyond EUV lithography

Surface-plasmon-assisted nanoscale photolithography by polarized light