Evaluation of defect density in bulk gallium nitrides by photothermal deflection spectroscopy and steady-state photocapacitance methods

Masatomo Sumiya,Hajime Fujikura,Yoshitaka Nakano,Shuhei Yashiro,Yasuo Koide,Tohru Honda
DOI: https://doi.org/10.1016/j.jcrysgro.2024.127701
IF: 1.8
2024-04-09
Journal of Crystal Growth
Abstract:Bulk GaN samples were characterized by both photothermal deflection spectroscopy (PDS) and steady-state photocapacitance (SSPC) methods. The PDS signal intensity in the bandgap was found to correlate quantitatively with the defect density estimated by the SSPC method. The defect density of GaN bulks fabricated by hydride vapor phase epitaxy (HVPE) was decreased by controlling the incorporating of carbon and silicon impurities. Differences in the reciprocal of the slope near the valence band maximum and the signal intensity in the bandgap among HVPE GaN bulks could be detected by PDS, although they had the same crystalline quality. PDS can be used to evaluate the GaN bulks that have been improved with a highly insulative property caused by Fe- doping or low carbon incorporation.
materials science, multidisciplinary,physics, applied,crystallography
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