Low-Frequency Noise Characterization of Positive Bias Stress Effect on the Spatial Distribution of Trap in β-Ga 2 O 3 FinFET

Hagyoul Bae,Geon Bum Lee,Jaewook Yoo,Khwang-Sun Lee,Ja-Yun Ku,Kihyun Kim,Jungsik Kim,Peide D. Ye,Jun-Young Park,Yang-Kyu Choi
DOI: https://doi.org/10.1016/j.sse.2024.108882
IF: 1.916
2024-02-18
Solid-State Electronics
Abstract:The reliability of a β -Ga 2 O 3 thin-film field-effect transistor is investigated under positive-bias stress (PBS). The transistor has a tri-gate structure with a gate dielectric of Al 2 O 3 . By characterizing low-frequency noise (LFN), the spatial distribution of trap in the gate dielectric was quantitatively extracted. The measured power spectral density (PSD) followed a 1/f-shape due to trapping and de-trapping of the channel carriers to and from the gate dielectric. Notably, the vertical distribution of the traps perpendicular to the interface of β -Ga 2 O 3 and Al 2 O 3 was mapped.
physics, condensed matter, applied,engineering, electrical & electronic
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