Lapping performance of diamond cone array tool prepared by double bias assisted HFCVD

Shuo Sun,Feng Xu,Lili Shi,Shengji Zhou,Yanchao Zhao,Chengzuan Gao,Dunwen Zuo
DOI: https://doi.org/10.1016/j.mtcomm.2022.103564
IF: 3.8
2022-06-01
Materials Today Communications
Abstract:In this paper, the free-standing diamond (FSD) and microcrystalline diamond (MCD) film were etched by double-bias assisted hot filament chemical vapor deposition (HFCVD) to prepare two kinds of diamond cone array tools (DCATs) for precision processing. It is the first time to use free-standing diamond cone array tool (FSD-CAT) and microcrystalline diamond cone array tool (MCD-CAT) to perform the lapping processing experiment for monocrystalline silicon and to carry out the performance evaluation of DCAT. The surface roughness of the silicon lapped by FSD-CAT is 28.9 nm, and the surface roughness of the silicon lapped by MCD-CAT is 18 nm. By using the combination of both DCATs to lapped silicon, a smooth surface with a surface roughness of 5 nm is obtained. By comparing the surface roughness of monocrystalline silicon which lapped by diamond tools with and without etching, because of the smaller cross-section of the cones cut into the surface of monocrystalline silicon, DCAT can effectively reduce the Surface roughness of the silicon.
materials science, multidisciplinary
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