Novel rotary chemical mechanical polishing on an integral impeller

Longxing Liao,Zhenyu Zhang,Fanning Meng,Dongdong Liu,Jie Liu,Yubiao Li,Xiangxiang Cui
DOI: https://doi.org/10.1016/j.jmapro.2021.04.010
IF: 5.684
2021-06-01
Journal of Manufacturing Processes
Abstract:<p>Traditional polishing on an integral impeller is labour intensive owing to its complicated curved surfaces. In this study, a novel rotary chemical mechanical polishing (R-CMP) for an integral impeller has been proposed using a developed polisher and a novel CMP slurry to improve efficiency and quality as compared to the traditional polishing method. The novel slurry consists of phosphoric acid (H<sub>3</sub>PO<sub>4</sub>), hydrogen peroxide (H<sub>2</sub>O<sub>2</sub>), nicotinic acid (NA) and silicon carbide (SiC). A model for predicting the surface roughness is established, according to the R-CMP process parameters during polishing an integral impeller, which is in good agreement with experimental results. It was found out that the polishing mechanism of R-CMP consists of four processing steps: oxidation, dissolution, chelating and removal. After R-CMP on an integral impeller, the surface roughness R<sub>a</sub> of the blade root is reduced from 1.664 to 0.559 μm, and the thickness of the damage layer is decreased from 900 to 350 nm. The polishing time is 2 h, which is faster than the conventional manual polishing on an integral propeller by twenty times. The findings in this research open a new pathway to polish an integral high performance component with complicated curved surfaces using immersive CMP at high efficiency and high quality, without the need to exert external pressure.</p>
engineering, manufacturing
What problem does this paper attempt to address?
### What problem does this paper attempt to solve? This paper primarily explores a novel Rotary Chemical Mechanical Polishing (R-CMP) method aimed at improving the surface quality and processing efficiency of integral impellers. #### Main Issues: 1. **Problems with traditional polishing methods**: - Due to the complex curved structure of integral impellers, traditional manual polishing is time-consuming and the quality is difficult to guarantee. - Manual polishing takes 40 hours to reduce the blade surface roughness from 1.6 μm to 0.8 μm, and the quality of polishing is highly dependent on the operator's experience. - Manual polishing is inefficient and harmful to the operator's health. 2. **Shortcomings of existing processing methods**: - CNC milling can smooth the blade surface, but due to the complex curved surfaces of the impeller blades, it cannot reach all contact points, resulting in residual material and vibration marks on the surface. - CNC abrasive belt grinding improves surface quality but leaves grinding burns and has low processing efficiency. #### Solution: - A novel Rotary Chemical Mechanical Polishing (R-CMP) method is proposed, which improves the polishing efficiency and quality of integral impellers by developing a new polishing slurry (containing phosphoric acid, hydrogen peroxide, nicotinic acid, and silicon carbide). - A mathematical model for predicting surface roughness was established and its validity was verified through experiments. - The study found that the R-CMP process consists of four steps: oxidation, dissolution, complexation, and removal. - Experimental results show that after R-CMP treatment, the surface roughness Ra at the root of the blade was reduced from 1.664 μm to 0.559 μm, and the damage layer thickness was reduced from 900 nm to 350 nm. - The polishing time is only 2 hours, nearly 20 times faster than traditional manual polishing. #### Conclusion: This study proposes an efficient and high-quality polishing method for integral impellers, suitable for the polishing needs of high-performance components with complex curved surfaces.