Low-loss chalcogenide photonic devices with a secondary coating method

Teng Wang,Yongxian An,Xiaolong Liu,Yixiao Gao,Tiefeng Xu,Wei Zhang
DOI: https://doi.org/10.1364/oe.519101
IF: 3.8
2024-03-09
Optics Express
Abstract:Teng Wang, Yongxian An, Xiaolong Liu, Yixiao Gao, Tiefeng Xu, Wei Zhang In the traditional dry etching process for photonic device fabrication, the etching effect is influenced in many ways, usually resulting in ... [Opt. Express 32, 10527-10534 (2024)]
optics
What problem does this paper attempt to address?