Copper metallization of electrodes for silicon heterojunction solar cells: Process, reliability and challenges

Jian Yu,Junjun Li,Yilin Zhao,Andreas Lambertz,Tao Chen,Weiyuan Duan,Wenzhu Liu,Xinbo Yang,Yuelong Huang,Kaining Ding
DOI: https://doi.org/10.1016/j.solmat.2021.110993
IF: 6.9
2021-06-01
Solar Energy Materials and Solar Cells
Abstract:<p>The crystalline silicon (c-Si) based technologies occupy 95% market share in the global photovoltaic (PV) production capacity. The conversion efficiency of silicon heterojunction (SHJ) solar cell in mass production has gone beyond 23%. The most pressing challenge hindering the industrial scale expansion of SHJ solar cell currently is the relatively high production cost as compared to the PERC (passivated emitter and rear cell) product. The low temperature silver paste utilized in the SHJ cell process accounts significantly for about 30% of the total processing cost due to its large consumption. Copper plating is of great current interest to silicon heterojunction application, which has a high potential to cut down the cost and improve cell efficiency by the remarkably reduced shading loss, increased electrode conduction and fill factor. However, there are still some critical issues need to be systematically optimized and proven for mass production. Selectively-deposited seed layer and stripping-free plating resist are the key factors to simplify the plating process. This paper gives a detailed look into the development of copper metallization for SHJ solar cell. Plating process involving seed layer formation and patterning methods are explicated. The process simplification and reliability are discussed aiming at its employment in industrial production.</p>
materials science, multidisciplinary,physics, applied,energy & fuels
What problem does this paper attempt to address?
The problem that this paper attempts to solve is the high - cost problem faced by silicon heterojunction solar cells (SHJ solar cells) in industrial production. In particular, compared with PERC (passivated emitter and rear cell) products, the production cost of SHJ cells is relatively high. Specifically, the paper focuses on how to reduce production costs and improve cell efficiency by replacing the traditional low - temperature silver paste with copper electroplating technology. The low - temperature silver paste accounts for approximately 30% of the cost in the production process of SHJ cells, and its resistivity is also relatively high. A large amount of silver paste is required to achieve good ohmic contact, which significantly affects the cost of SHJ cells. Copper electroplating technology has attracted great attention because of its potential to significantly reduce shadow loss, increase electrode conductivity and fill factor. However, there are still some key problems in the application of copper electroplating in SHJ cells, such as process complexity and long - term stability. These problems need to be systematically optimized and verified to adapt to large - scale production. The paper discusses in detail the development of copper electroplating technology, especially the electroplating process of seed layer formation and patterning methods, as well as strategies for simplifying the process and improving reliability.