Low-temperature spatial atomic layer deposited Ga 2 O 3 films for high-performance flexible deep ultraviolet photodetector

Chia-Hsun Hsu,Run-Feng Zhu,Pin-Chun Kang,Peng Gao,Wan-Yu Wu,Dong-Sing Wuu,Shui-Yang Lien,Wen-Zhang Zhu
DOI: https://doi.org/10.1016/j.matlet.2023.134204
IF: 3
2023-03-13
Materials Letters
Abstract:This research aims to prepare amorphous gallium oxide (α-Ga 2 O 3 ) films for use in flexible deep ultraviolet photodetectors. The films are deposited using high-speed spatial atomic layer deposition (SALD) at different substrate temperatures. The experimental results show that the saturating deposition rate at 145-155°C is four to sixteen times higher than that of temporal ALD. Moreover, under the saturated SALD conditions the deposited film has less carbon impurities, oxygen-related defects, and greater compactness than under non-saturated conditions. Finally, a high-performance flexible deep ultraviolet α-Ga 2 O 3 photodetector with fast decay time of 161 μs and low dark current density of 6.8×10 -10 A/cm 2 is achieved.
materials science, multidisciplinary,physics, applied
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