Highly flexible deep-ultraviolet photodetectors using amorphous gallium oxide thin films grown by atomic layer deposition

Kang Min Lee,Sun-Kyung Kim,Sang Woon Lee,Se Eun Kim
DOI: https://doi.org/10.1016/j.mtcomm.2022.104268
IF: 3.8
2022-08-21
Materials Today Communications
Abstract:Flexible deep ultraviolet (DUV) photodetectors have increased applicability in healthcare and electronic skin, however, sufficient flexibility of DUV photodetectors has not yet been achieved. In this study, we developed highly flexible DUV photodetectors using amorphous gallium oxide (GaO x ) films grown by atomic layer deposition, which enabled a bending radius as small as 1.5 mm. The high flexibility originated from a residual compressive strain in the GaO x films and the amorphous nature of the thin GaO x films (~ 25 nm) grown on polyimide substrates. Therefore, the high flexibility of DUV photodetectors can provide a promising opportunity in healthcare systems, e-skins, and wearable applications.
materials science, multidisciplinary
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