Nanotwinned Microstructure Engineering of Electroplated Copper for Enhanced Anti-corrosion in Alkaline Medium

Xing-Quan Liu,Zhe Li,Zhen-Jia Peng,Rui-Xun Wang,Zhi-Quan Liu
DOI: https://doi.org/10.1007/s12540-023-01489-5
IF: 3.451
2023-06-24
Metals and Materials International
Abstract:Electroplated copper is a key electronic interconnect material in integrated circuits and printed circuits and inevitably exposed to corrosive media in manufacturing processes. The present work reports, for the first time, that corrosion resistance of electroplated copper in 4 wt% NaOH is enhanced via nanotwinned microstructure engineering. Nucleation and growth of oxide/hydroxide on nanotwinned copper are inhibited, attributed to existence of highly (111)-preferred grain orientation and high-density parallelly-aligned coherent twin boundaries at surface. This study unveils a novel anti-corrosion strategy of nantowinned microstructure engineering against alkaline etchant, and exhibits great application values in industrial electroplating of copper, silver, or their alloys.Graphical Abstract
materials science, multidisciplinary,metallurgy & metallurgical engineering
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