Some properties of aluminium-nitride powder prepared by metal-organic chemical vapour deposition

Kazuro Kubo,Kiyoshi Itatani,F.Scott Howell,Akira Kishioka,Makio Kinoshita
DOI: https://doi.org/10.1016/0955-2219(95)00039-w
IF: 5.7
1995-01-01
Journal of the European Ceramic Society
Abstract:Ultrafine aluminium-nitride (AlN) powders with primary particle sizes of 10–20 nm were prepared by a metal-organic chemical vapour deposition (MOCVD): trimethylaluminium (Al(CH3)3), triethylaluminium (Al(C2H5)3) and triisobutylaluminium (Al(i-C4H9)3)-vapours were reacted with ammonia (NH3) at 1050 °C. The sintered compacts with relative densities of ~95% could be fabricated by firing these compressed powders at temperatures as low as 1600 °C. The relative densities of the Al(CH3)3-derived and Al(C2H5)3-derived compacts fired at 1800 °C for 10 h attained ~98%. The oxygen contents of these compacts were 1.8 and 4.7%, respectively.
materials science, ceramics
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