The effects of low boron incorporation on the structural and optical properties of BxGa1−xN/SiC epitaxial layers

Cosmin Romanitan,Juras Mickevičius,Florin Comanescu,Raluca Gavrila,Marius Stoian,Pericle Varasteanu,Arunas Kadys,Tadas Malinauskas,Emil-Mihai Pavelescu
DOI: https://doi.org/10.1107/s1600576724009579
IF: 4.868
2024-11-06
Journal of Applied Crystallography
Abstract:The effect of boron in BxGa1−xN/SiC heteroepitaxy was established by X‐ray diffraction reciprocal‐space maps on symmetric 0002 and asymmetric reflections. The density of screw and edge threading dislocations was quantified in the framework of the mosaic model.BGaN epilayers with boron contents up to 5.6% were grown on SiC substrates by metal–organic chemical vapor deposition. The effects of boron incorporation on the structural and optical properties were studied by high‐resolution X‐ray diffraction (XRD), atomic force microscopy (AFM), Raman spectroscopy and photoluminescence (PL) spectroscopy. XRD reciprocal‐space maps around the symmetric 0002 and asymmetric reflections allowed evaluation of the lattice constants and lattice mismatch with respect to the underlying substrate. XRD rocking curves and AFM measurements indicated the mosaic microstructure of the epilayer. The impact of boron content on crystallite size, tilt and twist is evaluated and the correlation with threading dislocation density is discussed. The deterioration of optical properties with increasing boron content was assessed by Raman and PL spectroscopy.
chemistry, multidisciplinary,crystallography
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