Fracture Toughness and Critical Thickness of β-(InxGa1-x)2O3 / Ga2O3 by First Principles

Jiahe Cao,Zhigao Xie,Yan Wang,Hanzhao Song,Guosong Zeng,Weihua Tang,Chee-Keong Tan
DOI: https://doi.org/10.1039/d3tc03010e
IF: 6.4
2023-12-22
Journal of Materials Chemistry C
Abstract:First-principles calculations were employed to determine the surface energy and fracture toughness of monoclinic Ga2O3 and (InxGa1-x)2O3 alloy with In content up to 37.5%. Lattice parameter and elastic constants of (InxGa1-x)2O3 alloys are calculated and proved the Vegard's law with increasing of In concentration. The most possible crack planes for each growth orientation, [100], [010] and [001], are determined through comparison with the surface energy and fracture toughness of monoclinic Ga2O3. In addition, the critical thickness of the (InxGa1-x)2O3 epitaxial film grows on Ga2O3 substrate in [100], [010] and [001] orientations are found to be 42 nm, 31 nm and 17 nm at In content up to 37.5%, respectively, presenting a reasonable pseudomorphic growth condition for (InxGa1-x)2O3 / Ga2O3 heterostructure formation. Based on analysis on bond lengths, dangling bonds and coordination of the surfaces, the stability of surface in (100) direction with surface terminations including both Ga and O atoms was found to have lower fracture toughness than the other surfaces, implying that epitaxial growth with (100) crack surface might result in lower defects with higher film thickness. Overall, cracking mechanism in (InxGa1-x)2O3 film grown on Ga2O3 substrate with different orientations are elucidated.
materials science, multidisciplinary,physics, applied
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