Phase Evolution and Amorphous Stability upon Solid-State Reaction in Superlattice-Like Ge–Sb–Te Combinatorial Thin Films

Jian Hui,Qingyun Hu,Yuxi Luo,Tianxing Lai,Zhan Zhang,Yang Ren,Lanting Zhang,Hong Wang
DOI: https://doi.org/10.1021/acsaelm.0c00717
IF: 4.494
2020-12-04
ACS Applied Electronic Materials
Abstract:In this paper, the superlattice-like (SLL) Ge–Sb–Te combinatorial thin films were prepared by using a high-throughput ion beam sputtering system. The phase evolution and amorphous stability of such films undergoing heat treatment as a function of the coating sequence and modulation period were systematically studied. The composition structure diagram was constructed via an automated process of data obtained by high-throughput synchrotron micro-X-ray diffraction and lab-based micro-X-ray fluorescence. The element distribution and microstructure in the depth direction of the SLL thin films were characterized with time-of-flight secondary ion mass spectrometry and transmission electron microscopy, respectively. These studies showed that the coating sequence has a significant effect on the element distribution in the as-deposited SLL thin films and the structure of the final product upon solid-state reaction. Reducing the modulation period of the SLL thin film improves the stability of the amorphous Ge–Sb–Te phase. This work lays a solid foundation for the rational design of SLL Ge–Sb–Te thin films to improve their performance.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acsaelm.0c00717?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acsaelm.0c00717</a>.Details of the deposition process (<a class="ext-link" href="/doi/suppl/10.1021/acsaelm.0c00717/suppl_file/el0c00717_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.
materials science, multidisciplinary,engineering, electrical & electronic
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