Modeling of 1S-1R crossbar array with Ti-doped VO2-based selector device

U. Dilna,S. N. Prasad
DOI: https://doi.org/10.1080/00150193.2023.2296310
2024-02-14
Ferroelectrics
Abstract:This article proposes a Ti-doped Vanadium dioxide (VO 2 ) selector device for reducing the leakage current. Here, TiO 2 is formed by the Ti atoms in the VO 2 film for acting like a good insulator. Hence, it reduces the integration density when the leakage current in a Cross Bar Array (CBA) is increased. In this article, the modeled Pt/Ti-doped VO 2 /Pt selector device is integrated with the resistive random-access memory model to demonstrate its effectiveness on sneak path current reduction. The ION/IOFF ratio of the suggested Ti-doped VO 2 selector is higher than 2×104. The simulated results outputs in terms of nonlinearity (∼ 28×104 ), current density (∼ 107A cm−2 ), and leakage current(∼0.31nA).
materials science, multidisciplinary,physics, condensed matter
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