GaN Super-Heterojunction FETs With 10-kV Blocking and 3-kV Dynamic Switching

Jesse T. Kemmerling,Rian Guan,Mansura Sadek,Yixin Xiong,Jianan Song,Sang-Woo Han,Sundar Isukapati,Woongje Sung,Rongming Chu
DOI: https://doi.org/10.1109/ted.2023.3346356
IF: 3.1
2024-02-02
IEEE Transactions on Electron Devices
Abstract:This article reports on two generations of GaN-on-sapphire super-heterojunction (SHJ) transistors, aiming at the realization of 10-kV class power transistors with low static and dynamic ON-resistance. First generation (Gen. 1) GaN SHJ-FETs used a single 2-D electron gas (2DEG) channel design with Schottky gate. Experimental results indicated the feasibility of achieving 10-kV blocking, however, room for improvement to reduce static source-to-drain ON-resistance and dynamic degradation. A second generation (Gen. 2) SHJ-MOSFET was designed using an epitaxy with two 2DEG channels for larger ON-state drain current and smaller . The high-voltage capability and dynamic degradation mitigation were reached by implementing the GaN SHJ design, while simultaneously avoiding surface trapping between the gate and the SHJ structure. Gen. 2 experimentally showed scaling of blocking voltage with SHJ length up to 10 kV, reduced static of mm (73.5 cm , low of ~4.9 ps, and controlled current collapse of 123% when switched from an OFF-state bias of 3 kV.
engineering, electrical & electronic,physics, applied
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