A General and Ultrafast Polishing Method with Truly Atomic Roughness

Yi Zhang,Yongjie Zhang,Kaixuan Gu,Linfeng Zhang,Yuanmin Zhu,Dianzi Liu,Hui Deng
DOI: https://doi.org/10.1021/acs.jpclett.3c02322
IF: 6.888
2023-10-14
The Journal of Physical Chemistry Letters
Abstract:The advancement of science and technology is always accompanied by better manufacturing precision. Ideally, the highest precision for manufacturing a surface is truly atomic flatness, which implies that all topmost surface atoms are in a single layer of the crystal face. However, almost no methods can achieve this surface with high efficiency at present. Herein, we present a method to fabricate a large-scale truly atomically flat surface with ultrafast speed. Through the selective etching of...
chemistry, physical,physics, atomic, molecular & chemical,nanoscience & nanotechnology,materials science, multidisciplinary
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