Low MOCVD growth temperature controlled phase transition of Ga2O3 films for ultraviolet sensing

Jianying Yue,Xueqiang Ji,Xiaohui Qi,Shan Li,Zuyong Yan,Zeng Liu,Peigang Li,Zhenping Wu,Yufeng Guo,Weihua Tang
DOI: https://doi.org/10.1016/j.vacuum.2022.111270
IF: 4
2022-09-01
Vacuum
Abstract:The influences of low growth temperatures (420–490 °C) on phase transition of Ga2O3 films grown on Al2O3 substrates by means of metal-organic chemical vapor deposition (MOCVD) are investigated here. The changes of crystal structure, phase composition, surface and cross-sectional morphologies are carried out by X-ray diffraction, atomic force microscope and field-emission scanning electron microscope to reveal the detail evolution from ε-phase to β-phase in Ga2O3 films. The fluctuant Gibbs free energy change relying on growth temperature induces different growth mechanism of Ga2O3 films. Furthermore, the ultraviolet photoresponse properties of different phase compositions for Ga2O3 films are compared by constructing metal-semiconductor-metal photodetectors. It is found that mixture phase Ga2O3 films express better photodetection performance than pure phase Ga2O3 films due to the formation of built-in field within phase junction. This proposed regulation principle of Ga2O3 phase transition provides a new route to high-performance photoelectric material.
materials science, multidisciplinary,physics, applied
What problem does this paper attempt to address?