Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Atomic step patterning in nanoimprint lithography: Molecular dynamics study

Glass nanoimprint using amorphous Ni–P mold etched by focused-ion beam

Molecular dynamics simulation study of the degradation of polymer nanopatterns created by nanoimprint

Molecular Dynamics Calculation of Resist Deformation Behavior in Nanoimprint

Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching

Molecular Dynamics Investigation of the Deformation Mechanism of Gold with Variations in Mold Profiles during Nanoimprinting

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Nano-fabrication System Based on Atomic Force Microscopy

Density variation of nanoscale patterns in thermal nanoimprint lithography

Coarse-Grain Simulations of the Polymer Filling Process in Nanolithography

Single-step maskless nano-lithography on glass by femtosecond laser processing

Development of a Step Micro-Imprint Lithography Tool

Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

Nanoimprint lithography technology

Single digit nanofabrication by step-and-repeat nanoimprint lithography

Unconventional Lithography for Patterned Nanomaterials

Atomic-Scale Imprinting by Sputter Deposition of Amorphous Metallic Films

Study of Direct Nanoimprinting Processes by Molecular Dynamics Simulations

Quality Research of High-Conformity Patterning for Imprint Lithography

Coherent Atomic-Scale Ripples on Metallic Glasses Patterned by Low-Energy Ion Irradiation for Large-Area Surface Structuring

Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat Nanoimprint Process