Molecular dynamics simulation study of the degradation of polymer nanopatterns created by nanoimprint

Zhu Suhua,Yan Liuming,Lu Wencong
2007-01-01
Abstract:Nanoimprint technology is one of the promising technologies for the next generation of IC industry. One of the drawbacks of nanoimprint is blurring or degradation of the nanopattern due to the relaxation movement of the polymer strings. Poly(methyl methacrylate), PMMA, has been widely used as a photoresist material for nanoscale and microscale fabrications. In this work, we studied the relaxation movement of PMMA nanopattern using molecular dynamics simulations. In the simulations, the all-atom force field model is applied the PMMA.
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