Abstract:Some imaging optical systems include diffraction elements, both the even reflected stray light and multi-order diffraction stray light need to be considered at the image. They are related to the reflectivity and diffraction efficiency of optical surfaces. In this paper the binary tree is employed to describe the multifurcating tree in which each sampling ray's information is kept. According to the multi-order diffraction efficiency, paraxial ray and real sampling rays are traced, and the calculating results are applied to analyze the stray light in optical systems including diffraction components, and then the stray light energy distribution at any space especially at the image can be obtained. A new calculated wavelength is used to replace the designing wavelength for binary optical elements to calculate the reflected diffraction stray light. Based on the principles above, the stray light analysis software is developed. By tracing and analyzing all sampling rays the positions of ghosts are shown, especially at image surface. In this procedure, the first surface of the system serves as the entrance pupil or stop, instead of the entrance pupil in original imaging system, so as to collect all sampling rays from all direction, in or out the field of view, and then all possible ghosts are obtained. According to the simulation, the glare shields or control methods can be designed.

Applications of RCWA on EUV mask optics

Alleviating Image Artifacts in Wavefront Coding Extended Depth of Field Imaging System

Fast and Robust Phase Retrieval for Masked Coherent Diffractive Imaging

Cubic Sinusoidal Phase Mask: Another Choice to Extend the Depth of Field of Incoherent Imaging System

Wavefront reconstruction for double-grating Ronchi lateral shearing interferometry with nonlinear optimization

Rigorous Simulation of 3D Masks

Highly Efficient Rigorous Coupled-Wave Analysis Implementation Without Eigensystem Calculation

Mask innovations on the eve of High NA EUV lithography

Conical diffractions of multilayered gratings modeled by Cartesian rigorous coupled-wave analysis

Stray light simulation and control in imaging systems including diffraction elements

The refined EUV mask model

Accurate near-field calculation in the rigorous coupled-wave analysis method

Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis

Theoretical and numerical analysis of EUV lithography mask blank fabrication

Experimental investigation of a high-k reticle absorber system for EUV lithography

Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations

Residence Time Statistics for Normal and Fractional Diffusion in a Force Field

Fast lithography simulation method of complex mask pattern with large-area

Efficient and Stable Implementation of RCWA for Ultrathin Multilayer Gratings: T -Matrix Approach Without Solving Eigenvalues

Propagation and Diffraction of Partial Coherent Light in Uv-Lithography

Analysis of Effective Wave-Front Affecting Diffraction Field in Proximity Lithography