Method for simultaneously reducing the misalignment offset and separating the Hall voltage from the off‐diagonal piezoresistive voltage in Hall effect and piezoresistive devices based on silicon

R. G. Mani,K. von Klitzing,F. Jost,K. Marx,S. Lindenkreuz,H. P. Trah
DOI: https://doi.org/10.1063/1.115110
IF: 4
1995-10-09
Applied Physics Letters
Abstract:A novel misalignment offset reduction technique is extended in order to separate a piezoresistive voltage, from the Hall voltage, in doubly connected Hall elements based on silicon. In a special configuration, this method exploits directional averaging using biaxial current injection from four electrically separate current sources in order to cancel in situ the stress-generated off-diagonal piezoresistive voltage across the Hall voltage contacts. Measurements suggest field-equivalent offsets below 1 mT in (001) surface n-Si devices with current injection in the [110] direction.
physics, applied
What problem does this paper attempt to address?