A Novel Method to Extract Channel Mobility and Parasitic Resistance of 2-D Material MOSFETs
Aslan Wei,D. Mahaveer Sathaiya,Terry Y. T. Hung,Edward Chen,Tai-Yuan Wang,Wen-Chia Wu,Chao-Ching Cheng,Iuliana P. Radu,Jeff Wu,Chung-Cheng Wu
DOI: https://doi.org/10.1109/ted.2024.3449254
IF: 3.1
2024-09-28
IEEE Transactions on Electron Devices
Abstract:A novel technique, called Fermi-Dirac (FD)-function method, is proposed for extracting channel mobility ( ) and parasitic resistance ( ) of 2-D material (2DM) MOSFETs. The functional form of this method is formalized using three (two) parameters for describing the gate bias-dependent ( ) of a back gate (BG) and top gate (TG) 2-D MOSFET. The method is successfully demonstrated by uniquely extracting these parameters from an antimony (Sb) contacted MoS2 BG-MOSFET experimental data. Also demonstrated our FD-function method on palladium (Pd) contacted WSe2 top-gated BG-MOSFET experiments. The extraction accuracy is tested against experiment calibrated TCAD simulations with widely different and . These tests show and extraction errors within ±10% and ±8%, respectively. Thus, the proposed FD-function method is highly accurate enables fast extraction and can be easily incorporated in the routine industrial wafer acceptance testing (WAT).
engineering, electrical & electronic,physics, applied