n-Type doping of diamond by hot-filament chemical vapor deposition growth with phosphorus incorporation

Yūki Katamune,Daichi Mori,Daisuke Arikawa,Akira Izumi,Takehiro Shimaoka,Kimiyoshi Ichikawa,Satoshi Koizumi
DOI: https://doi.org/10.1007/s00339-020-04060-w
2020-10-21
Applied Physics A
Abstract:Epitaxial growth of n-type semiconductor diamond films on (111)-oriented diamond has been achieved by hot-filament chemical vapor deposition (HFCVD) using a methane source and a trimethylphosphine dopant source. Secondary-ion mass spectrometry showed that the phosphorus atoms are incorporated into the films in the concentration range of 10<sup>18</sup>–10<sup>19</sup> cm<sup>−3</sup> from the vapor phase. Hall-effect measurements confirmed n-type conductivity in a wide temperature range up to 873 K. Electrons are thermally activated from a phosphorus donor level of approximately 0.57 eV as dominant carriers under the presence of tungsten atoms with concentrations of around 10<sup>18</sup> cm<sup>−3</sup> from filaments. These results indicate that HFCVD has the potential to be applied to an n-type doping process for fabricating diamond electronic devices in the phosphorus concentration range of not lower than 10<sup>18</sup> cm<sup>−3</sup>.
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