Abstract:Nanocrystalline diamond films have been deposited on WC-Co (6% Co) cemented tungsten carbides substrate using reactive gases of acetone, hydrogen and argon by the hot filament chemical vapor deposition (HFCVD) technique. The as-grown films are characterized by SEM, AFM, HR-TEM, XRD and Raman spectroscopy. SEM photographs show that the nanocrystalline diamond films consist of unfaceted diamond grains. Further investigation using AFM reveal that the average size of the grains is 50-100 nm. The studies show that the grain sizes of the nanocrystalline diamond films are reduced to the nanometer scale and second nucleation rates are very high. The full width at half maximum (FWHM) of XRD patterns of films is high compared with the CVD grown microcrystalline films. The measured lattice plane spacing {111} is observed by HR-TEM. The lattice spacing d(111) estimated from {111} planes is 0.209 nm, which is close to the standard value 0.206 nm. The Raman spectrum of the films typically exhibited nanocrystalline features at approximately 1332 cm(-1) which is attributed to the nanocrystalline diamond or disordered sp(3) carbon phase and approximately 1560 cm(-1) which is assigned to graphitic phase on the diamond grain boundaries. The research results demonstrate that nanocrystalline diamond films could be successfully deposited on WC-Co (6%Co) cemented tungsten carbides substrate.

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