Valence Band Structure of Chalcogenide Obtained by X‐Ray Photoelectron Spectroscopy and Etching Technique

Shujing Jia,Nannan Shi,Jiabin Shen,Renjie Wu,Qi Liu,Zhitang Song,Min Zhu
DOI: https://doi.org/10.1002/pssb.202100038
2021-05-07
physica status solidi (b)
Abstract:Chalcogenide glass, such as GeSe, has been widely used in the selector device for the high‐density vertically stackable memory application owing to their nonlinearly electrical property. The electronic structure of the valence band, from which the nature of the bonding, the short‐range structure and the fermi level can be obtained, is of great importance to understand their unique electrical behavior. However, the surface oxidation issue makes it difficult to obtain the accurate valence band structure by X‐ray photoelectron spectroscopy (XPS). In this work, XPS depth profiles using the combination of the monatomic and cluster ion etching are performed to determine the valence band structures of amorphous Ge‐Se films capped with a thin carbon layer. The completely different etching behavior dependent on the composition in depth profiles may be closely associated with the intrinsic bonding configurations of amorphous films. After obtaining the fresh surface, the intrinsic valence band structures of amorphous Ge‐Se samples demonstrate the different bonding behavior and short‐range structure. Most importantly, the fermi level of amorphous GexSe100‐x compounds is also determined.This article is protected by copyright. All rights reserved.
physics, condensed matter
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