Induced uniaxial magnetic anisotropy and film magnetostriction in very thin permalloy films

H. Katada,T. Shimatsu,I. Watanabe,H. Muraoka,Y. Nakamura,Y. Sugita,I. Katada

DOI: https://doi.org/10.1109/20.951164

IF: 1.848

2001-07-01

IEEE Transactions on Magnetics

Abstract:The induced uniaxial anisotropy field $H_{k}$ in very thin films sandwiched by Ta or Cu layers was investigated. The value of $H_{k}$ of the Ta/Cu/Ni79 Fe21/Cu/Ta film decreases as film thickness decreases below 20 nm, even after an annealing procedure in a magnetic field. This $H_{k}$reduction is similar to that of the Ta/Ni79 Fe21/Ta films, indicating that the $H_{k}$ reduction is independent of surface energy and/or crystal structure of seed layers. The value of film magnetostriction $\lambda _{p-p}$ of the Ta/NiFe/Ta films gradually increases as the thickness decreases, which is coincident with the reduction of $H_{k}$. However, the increase of the $\lambda _{p-p}$ values, by decreasing Ni concentration or annealing the films, resulted in conflicting $H_{k}$values. These results indicate that the $H_{k}$reduction in thin films is not simply caused by the magnetostrictive effect.

engineering, electrical & electronic,physics, applied