Abstract:Abstract The microwave cutoff probe (CP) is an accurate diagnostic technique to measure absolute electron density even in processing gas plasmas. Because this technique needs the installation of two probe tips and a probe body in the plasma chamber, it may cause plasma perturbation in semiconductor plasma processing; this may increase the uncertainty of the measured value. In this work, a flat CP, which is embedded in the substrate chuck or chamber wall, is proposed to measure electron density without plasma perturbation and to monitor processing plasma in real-time. We first evaluated the performance of various types of flat CPs, such as the point CP, ring CP, and bar cutoff probe (BCP), through electromagnetic (EM) field simulation. The BCP showed better performance with clearer cut-off signal characteristics and minimization of noise signals compared with the other probe types. Therefore, we focused on the characteristics of the BCP through experiments and/or EM simulations and concluded the followings: (i) the measured electron densities of the BCP agree well with those of the conventional CP; (ii) the BCP measures the plasma density near the plasma-sheath boundary layer, which is very closely adjacent to the chamber wall or wafer; (iii) it was demonstrated for the first time that the plasma density can be measured, even though the processing wafers such as un-doped silicon, P type silicon, amorphous carbon, or amorphous carbon/SiO 2 patterned wafers were placed on the flat CP; and (iv) we performed real-time measurements of the electron density using the BCP covered with the wafers in plasmas with various process gases, such as Ar, NF 3 , and O 2 . These results indicate that the chuck-embed-type or wall-type flat CP can be used as a real-time electron density measurement (monitoring) tool during industrial plasma processing, such as during etching, deposition, sputtering or implantation, and the chuck-embed-type flat CP can measure the plasma density impinging on the wafer in real-time without stopping the processing.

Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas

Theoretical and Experimental Study of the Microwave Cut-off Probe for Electron Density Measurements in Low-Temperature Plasmas

Analysis of uncertainty in measurement of electron temperature in low-pressure inductively coupled plasmas using microwave cutoff probe

Electron density measurements in low-pressure plasmas using cutoff probes and comparison with hairpin and Langmuir probes

Plasma Oscillation Method for Measurements of Absolute Electron Density in Plasma

Flat cutoff probe for real-time electron density measurement in industrial plasma processing

Plasma probe characteristics in low density hydrogen pulsed plasmas

Electron density measurement of an ionospheric-like plasma using an impedance probe

Experimental validation of particle-in-cell/Monte Carlo collisions simulations in low-pressure neon capacitively coupled plasmas

Research on Low Pressure Electronic Density Diagnostic Method of Single Paperback Probe Based on Langmuir Probe Theory

Diagnosis of bound electron density by measuring energy loss of proton beam in a partially ionized plasma target

Investigation on the electron density and temperature in a nanosecond pulsed helium plasma jet with Thomson scattering

Development of a flat cutoff probe covered with a dielectric layer for non-invasive plasma diagnostics

An Electromagnetic-Plasma Fluid Model Simulation of Waveguide Plasma Limiter Filled with Different Easily Ionized Inert Gas

Wavefront-sensor-based Electron Density Measurements for Laser-Plasma Accelerators.

Electron density and temperature measurement by continuum radiation emitted from weakly ionized atmospheric pressure plasmas

Experimental studies and COMSOL 1-D simulation in Ar capacitively coupled plasmas

A Novel Method to Determine Electron Density by Optical Emission Spectroscopy in Low-Pressure Nitrogen Plasmas

Measurement Of The Electron Density In A Microwave Plasma Torch At Atmospheric Pressure

Measurement on Electron Density of High-Power and Large-Volume ICP-heated Wind Tunnel with HCN Laser Interferometer

OPTICALEMISSIONMEASUREMENTS OFLASER INITIATED, RFSUSTAINEDHIGHPRESSURE SEEDEDPLASMAS*