A density functional theory study of the atomic structure, formation energy, and vibrational properties of nitrogen-vacancy-oxygen defects in silicon

F. Sahtout Karoui,A. Karoui
DOI: https://doi.org/10.1063/1.3387912
IF: 2.877
2010-08-01
Journal of Applied Physics
Abstract:The atomic structure, energy, stability, vibrational spectra, and infrared absorption intensities of major intrinsic nitrogen-related defects in nitrogen doped silicon crystals have been investigated using ab initio density functional theory and semi-empirical quantum mechanics methods. The defects that are of interest are nitrogen-vacancy-oxygen complexes which are believed to affect oxygen precipitation and void formation as well as nitrogen concentration measurement in nitrogen-doped silicon. Several chemical reactions involving nitrogen, Si vacancies and oxygen interstitial have been studied. After relaxation, the local vibrational modes of each complex are calculated within the harmonic oscillator approximation and the infrared absorption intensities are evaluated from the dipole moment derivatives. By cross correlating the stability and the infrared active lines of the defect, and taking into consideration the symmetry group of each complex, we were able to emphasize which nitrogen related complexes are likely to control the oxygen precipitation and voids formation and to assert a new calibration relationship for nitrogen concentration measurement in nitrogen doped Czochralski and float zone silicon wafers.
physics, applied
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